Physics
Excimer Laser
100%
Laser
94%
Laser Annealing
63%
Pulsed Laser
50%
Substrates
37%
Pulses
34%
Atoms
28%
Aluminium
27%
Temperature
26%
Growth
25%
Crystallization
24%
Thin Films
23%
Fabrication
22%
Diamonds
22%
Particle
22%
Crystals
21%
ZnO
20%
Ratios
19%
Area
18%
Diode
18%
Laser Ablation
17%
Optical Vortex
16%
Germanium
16%
Insulators
16%
Region
14%
Liquids
14%
Ion Implantation
13%
Fluence
13%
Utilization
13%
Mobility
13%
Water
13%
Electrical Resistivity
12%
Diffusivity
12%
Ablation
12%
Cooling
11%
Permittivity
10%
Room Temperature
10%
Semiconductor
10%
Pulsed Laser Deposition
9%
Annealing
9%
Targets
9%
Solid Phase
8%
Solid State
8%
Simulation
8%
High Temperature
8%
Nitrogen
8%
Pressure
8%
Ultraviolet Laser
8%
Ion
8%
Microstructure
8%
High Speed
8%
Film Thickness
8%
Oxide
8%
Implantation
8%
Air
7%
Images
7%
Quartz
7%
Transistor
7%
Grain Size
7%
Optical Device
7%
Coating
7%
Electron Density
7%
Luminescence
7%
Silicon Carbide
7%
Defects
7%
Electrodes
7%
Whispering Gallery Modes
7%
Electrical Properties
6%
Silicon
6%
Microcrystals
6%
Increasing
6%
Graphene
6%
Electric Potential
6%
Width
6%
Laser Beams
6%
Value
6%
Melting Point
6%
Nanorod
5%
Magnitude
5%
Zinc
5%
Solubility
5%
Parameter
5%
Gases
5%
Optical Properties
5%
Heating
5%
Material Science
Laser
66%
Liquid Films
62%
Thin-Film Transistor
56%
Crystallization
52%
Thin Films
43%
Doping (Additives)
36%
Solution
33%
Devices
32%
Surface
26%
Amorphous Material
24%
Crystal
22%
Irradiation
22%
Carrier Concentration
21%
Microsphere
18%
Annealing
15%
Coating
14%
Quartz
14%
Nanoparticle
13%
Temperature
13%
Defect
13%
Semiconductor Material
11%
Zinc Oxide
11%
Carrier Mobility
10%
Electronics
9%
Buffer Layer
9%
Air
9%
Laser Pulse
9%
Pulsed Laser Deposition
8%
Solid
8%
Flexible Substrate
8%
Material
7%
Gallium Nitride
7%
Optical Device
7%
Cone Structure
7%
Liquid
7%
Impurity
6%
Crystalline Material
6%
Oxide
6%
Surface Morphology
5%
Oxygen Vacancy
5%
Characterization
5%
Grain Growth
5%
Contact Resistance
5%
Engineering
Laser Irradiation
68%
Excimer Laser
51%
Surfaces
34%
Thin-Film Transistor
33%
Thin Films
31%
Substrates
29%
Fabrication
25%
Activation
20%
Characteristics
20%
Low-Temperature
19%
Radiation Effect
19%
Polysilicon
18%
Pn Junction
17%
Laser Fluence
15%
Thermal Annealing
15%
Dopants
15%
Coating
14%
Annealing
13%
Defects
13%
Dopant Activation
13%
Acid Solution
13%
Implantation
10%
Aluminum
10%
Carrier Concentration
10%
Pulsed Laser
8%
High Concentration
8%
Annealing Process
8%
Spherical Particle
7%
Zinc Oxide
7%
Si Wafer
7%
Generators
7%
Germanium
7%
High Temperature
7%
Measurement
7%
Room Temperature
6%
Buffer Layer
6%
Laser Energy
6%
High Degree
6%
Current Drive
6%
Water
6%
Applications
6%
Surface Morphology
5%
Lower Temperature
5%
Nanosecond
5%
Lithography
5%
Stability
5%
Low Resistance
5%
Recrystallization
5%
Ideality Factor
5%
Laser Light
5%
Laser Beam
5%
Silicon
5%
Implanted Sample
5%
Heating
5%