Research Output 1982 2020

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2000

Oxynitridation of Si with nitrogen plasma for flash memory and its high frequency C-V characteristics

Ikeda, A., Elnaby, M. A., Fujimura, T., Hattori, R. & Kuroki, Y., Dec 1 2000, Advances in Physics, Electronics and Signal Processing Applications. World Scientific and Engineering Academy and Society, p. 178-182 5 p.

Research output: Chapter in Book/Report/Conference proceedingChapter

Nitrogen plasma
Flash memory
Plasmas
Oxidation
Nitridation