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Fingerprint Dive into the research topics where Kazunori Koga is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 4 Similar Profiles
Plasmas Engineering & Materials Science
Plasma CVD Engineering & Materials Science
plasma jets Physics & Astronomy
vapor deposition Physics & Astronomy
Solar cells Engineering & Materials Science
Chemical vapor deposition Engineering & Materials Science
solar cells Physics & Astronomy
Semiconductor quantum dots Engineering & Materials Science

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Research Output 1999 2020

Plasma CVD
Electric discharges
Metallic films
electric discharges
Silicon
1 Citation (Scopus)

Local supply of reactive oxygen species into a tissue model by atmospheric-pressure plasma-jet exposure

Kawasaki, T., Mitsugi, F., Koga, K. & Shiratani, M., Jun 7 2019, In : Journal of Applied Physics. 125, 21, 213303.

Research output: Contribution to journalArticle

Open Access
plasma jets
atmospheric pressure
oxygen
starches
reagents
1 Citation (Scopus)

Progress and perspectives in dry processes for emerging multidisciplinary applications: How can we improve our use of dry processes?

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0803.

Research output: Contribution to journalReview article

emerging
Plasmas
Atmospheric pressure
atmospheric pressure
multidisciplinary research
1 Citation (Scopus)

Progress and perspectives in dry processes for leading-edge manufacturing of devices: Toward intelligent processes and virtual product development

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0804.

Research output: Contribution to journalReview article

product development
leading edges
Product development
manufacturing
Plasmas
1 Citation (Scopus)

Progress and perspectives in dry processes for nanoscale feature fabrication: Fine pattern transfer and high-aspect-ratio feature formation

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0802.

Research output: Contribution to journalReview article

high aspect ratio
Aspect ratio
Fabrication
fabrication
semiconductor devices