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Research Output 1999 2020

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6 Citations (Scopus)

A device for trapping nano-particles formed in processing plasmas for reduction of nano-waste

Iwashita, S., Koga, K. & Shiratani, M., Feb 26 2007, In : Surface and Coatings Technology. 201, 9-11 SPEC. ISS., p. 5701-5704 4 p.

Research output: Contribution to journalArticle

Plasma applications
trapping
Respiratory system
Stainless Steel
Deposits
28 Citations (Scopus)

Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells

Seo, H., Wang, Y., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., Apr 15 2013, In : Electrochimica Acta. 95, p. 43-47 5 p.

Research output: Contribution to journalArticle

Polysulfides
Electrolytes
Semiconductor quantum dots
Redox reactions
Solar cells
5 Citations (Scopus)

Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells

Seo, H., Ichida, D., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., Feb 1 2014, In : International Journal of Precision Engineering and Manufacturing. 15, 2, p. 339-343 5 p.

Research output: Contribution to journalArticle

Semiconductor quantum dots
Solar cells
Paint
Light absorption
Chemical vapor deposition
10 Citations (Scopus)

Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K., Shiratani, M., Onishi, M., Takeshita, M., Kinoshita, T., Koga, K. & Watanabe, Y., Apr 1 2002, In : Materials Science in Semiconductor Processing. 5, 2-3, p. 301-304 4 p.

Research output: Contribution to journalArticle

Copper
Chemical vapor deposition
vapor deposition
Plasmas
copper
8 Citations (Scopus)

Anisotropic deposition of Cu in trenches by H-assisted plasma chemical vapor deposition

Takenaka, K., Kita, M., Kinoshita, T., Koga, K., Shiratani, M. & Watanabe, Y., Jul 1 2004, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 22, 4, p. 1903-1907 5 p.

Research output: Contribution to journalArticle

Chemical vapor deposition
vapor deposition
Plasmas
Deposition rates
Impurities
7 Citations (Scopus)

Behavior of the ion sheath instability in a negative ion plasma

Koga, K. & Kawai, Y., Dec 1 1999, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 38, 3 A, p. 1553-1557 5 p.

Research output: Contribution to journalArticle

ion sheaths
Plasma sheaths
Plasma stability
negative ions
Negative ions
2 Citations (Scopus)

Blue Photoluminescence of (ZnO)0.92(InN)0.08

Matsushima, K., Iwasaki, K., Miyahara, N., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., Jan 1 2017, In : MRS Advances. 2, 5, p. 277-282 6 p.

Research output: Contribution to journalArticle

Photoluminescence
photoluminescence
Lattice constants
lattice parameters
room temperature
8 Citations (Scopus)

Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall

Koga, K., Uehara, R., Kitaura, Y., Shiratani, M., Watanabe, Y. & Komori, A., Apr 1 2004, In : IEEE Transactions on Plasma Science. 32, 2 I, p. 405-409 5 p.

Research output: Contribution to journalArticle

fiber composites
carbon fibers
fibers
carbon
interactions
3 Citations (Scopus)

Characteristics of crystalline silicon/Si quantum dot/poly(3,4- ethylenedioxythiophene) hybrid solar cells

Uchida, G., Wang, Y., Ichida, D., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., Nov 1 2013, In : Japanese journal of applied physics. 52, 11 PART 2, 11NA05.

Research output: Contribution to journalArticle

Semiconductor quantum dots
Solar cells
solar cells
quantum dots
Crystalline materials
8 Citations (Scopus)

Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells

Uchida, G., Sato, M., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., Oct 1 2013, In : Thin Solid Films. 544, p. 93-98 6 p.

Research output: Contribution to journalArticle

Photocurrents
Semiconductor quantum dots
photocurrents
Solar cells
solar cells
11 Citations (Scopus)

Clustering phenomena in low-pressure reactive plasmas. Basis and applications

Watanabe, Y., Shiratani, M. & Koga, K., Jan 1 2002, In : Pure and Applied Chemistry. 74, 3, p. 483-487 5 p.

Research output: Contribution to journalArticle

Flow of gases
Plasmas
Dilution
Hydrogen
Gases
44 Citations (Scopus)
silicon films
Amorphous silicon
amorphous silicon
Chemical vapor deposition
vapor deposition
12 Citations (Scopus)

Combinatorial deposition of microcrystalline silicon films using multihollow discharge plasma chemical vapor deposition

Koga, K., Matsunaga, T., Kim, Y., Nakahara, K., Yamashita, D., Matsuzaki, H., Kamataki, K., Uchida, G., Itagaki, N. & Shiratani, M., Jan 1 2012, In : Japanese Journal of Applied Physics. 51, 1 PART 2, 01AD02.

Research output: Contribution to journalArticle

Microcrystalline silicon
silicon films
plasma jets
Chemical vapor deposition
vapor deposition
8 Citations (Scopus)

Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film

Koga, K., Matsunaga, T., Nakamura, W. M., Nakahara, K., Kawashima, Y., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., Aug 1 2011, In : Thin Solid Films. 519, 20, p. 6896-6898 3 p.

Research output: Contribution to journalArticle

Silicon
Nanoparticles
Crystalline materials
Thin films
nanoparticles

Controlling feeding gas temperature of plasma jet with Peltier device for experiments with fission yeast

Yoshimura, S., Aramaki, M., Otsubo, Y., Yamashita, A. & Koga, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SEEG03.

Research output: Contribution to journalArticle

Plasma jets
yeast
gas temperature
Yeast
plasma jets
11 Citations (Scopus)

Control of deposition profile of copper for large-scale integration (LSI) interconnects by plasma chemical vapor deposition

Takenaka, K., Shiratani, M., Takeshita, M., Kita, M., Koga, K. & Watanabe, Y., Feb 1 2005, In : Pure and Applied Chemistry. 77, 2, p. 391-398 8 p.

Research output: Contribution to journalArticle

LSI circuits
Copper
Chemical vapor deposition
Plasmas
Ion bombardment
1 Citation (Scopus)

Control of nanostructure of plasma CVD films for third generation photovoltaics

Shiratani, M., Nakamura, W. M., Miyahara, H. & Koga, K., Jun 1 2007, In : Journal of Physics: Conference Series. 86, 1, 012021.

Research output: Contribution to journalArticle

vapor deposition
amorphous silicon
reactors
degradation
production costs
5 Citations (Scopus)

Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage

Kamataki, K., Koga, K., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., Nov 15 2012, In : Thin Solid Films. 523, p. 76-79 4 p.

Research output: Contribution to journalArticle

radio frequency discharge
Amplitude modulation
Plasmas
Electric potential
electric potential
5 Citations (Scopus)

Correlation between SiH2/SiH and light-induced degradation of p-i-n hydrogenated amorphous silicon solar cells

Keya, K., Kojima, T., Torigoe, Y., Toko, S., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., Jan 1 2016, In : Japanese Journal of Applied Physics. 55, 7S2, 07LE03.

Research output: Contribution to journalArticle

Silicon solar cells
Amorphous silicon
amorphous silicon
Solar cells
solar cells
37 Citations (Scopus)
Hydrogen
Volume fraction
hydrogen
Plasma CVD
reactors
4 Citations (Scopus)

Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Kim, Y., Hatozaki, K., Hashimoto, Y., Uchida, G., Kamataki, K., Itagaki, N., Seo, H., Koga, K. & Shiratani, M., Nov 1 2013, In : Japanese journal of applied physics. 52, 11 PART 2, 11NA07.

Research output: Contribution to journalArticle

silicon films
Amorphous silicon
amorphous silicon
light emission
Volume fraction
4 Citations (Scopus)

Densities and Surface Reaction Probabilities of Oxygen and Nitrogen Atoms during Sputter Deposition of ZnInON on ZnO

Matsushima, K., Ide, T., Takeda, K., Hori, M., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., Feb 2017, In : IEEE Transactions on Plasma Science. 45, 2, p. 323-327 5 p., 7828157.

Research output: Contribution to journalArticle

nitrogen atoms
surface reactions
oxygen atoms
gas flow
atoms

Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih 4+b10h1 4 multi-hollow discharge plasma chemical vapor deposition

Koga, K., Nakahara, K., Kim, Y. W., Matsunaga, T., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., Jan 1 2012, In : Japanese Journal of Applied Physics. 51, 1 PART 2, 01AD03.

Research output: Contribution to journalArticle

silicon films
Amorphous silicon
plasma jets
amorphous silicon
Chemical vapor deposition
2 Citations (Scopus)

Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD

Koga, K., Nakahara, K., Kim, Y. W., Kawashima, Y., Matsunaga, T., Sato, M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., Oct 1 2011, In : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 3013-3016 4 p.

Research output: Contribution to journalArticle

plasma jets
hollow
vapor deposition
surface reactions
defects

Dielectric barrier discharge plasma treatment-induced changes in sunflower seed germination, phytohormone balance, and seedling growth

Zukiene, R., Nauciene, Z., Januskaitiene, I., Pauzaite, G., Mildaziene, V., Koga, K. & Shiratani, M., Jan 1 2019, In : Applied Physics Express. 12, 12, 126003.

Research output: Contribution to journalArticle

Open Access
sunflowers
germination
plasma jets
Seed
seeds
3 Citations (Scopus)

Discharge power dependence of carbon dust flux in a divertor simulator

Nishiyama, K., Morita, Y., Uchida, G., Yamashita, D., Kamataki, K., Seo, H., Itagaki, N., Koga, K., Shiratani, M., Ashikawa, N., Masuzaki, S., Nishimura, K., Sagara, A., Bornholdt, S. & Kersten, H., Jan 1 2013, In : Journal of Nuclear Materials. 438, SUPPL, p. S788-S791

Research output: Contribution to journalArticle

simulators
Dust
Carbon
Simulators
dust
7 Citations (Scopus)

Discharge power dependence of Hα intensity and electron density of Ar + H2 discharges in H-assisted plasma CVD reactor

Umetsu, J., Koga, K., Inoue, K., Matsuzaki, H., Takenaka, K. & Shiratani, M., Aug 30 2008, In : Surface and Coatings Technology. 202, 22-23, p. 5659-5662 4 p.

Research output: Contribution to journalArticle

Plasma CVD
Carrier concentration
reactors
vapor deposition
Deposition rates
2 Citations (Scopus)

Dust hour glass in a capacitive RF discharge

Iwashita, S., Schungel, E., Schulze, J., Hartmann, P., Donko, Z., Uchida, G., Koga, K., Shiratani, M. & Czarnetzki, U., Oct 1 2014, In : IEEE Transactions on Plasma Science. 42, 10, p. 2672-2673 2 p., 6880766.

Research output: Contribution to journalArticle

dust
glass
electrodes
radio frequency discharge
asymmetry
6 Citations (Scopus)

Dust particle formation due to interaction between graphite and helicon deuterium plasmas

Iwashita, S., Nishiyama, K., Uchida, G., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., Jan 1 2013, In : Fusion Engineering and Design. 88, 1, p. 28-32 5 p.

Research output: Contribution to journalArticle

Helicons
Graphite
Deuterium
Beam plasma interactions
Particles (particulate matter)
Silicon
Plasma enhanced chemical vapor deposition
silicon films
Amorphous silicon
Dilution
15 Citations (Scopus)

Effect of nitridation of si nanoparticles on the performance of quantum-dot sensitized solar cells

Uchida, G., Yamamoto, K., Sato, M., Kawashima, Y., Nakahara, K., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., Jan 1 2012, In : Japanese journal of applied physics. 51, 1 PART 2, 01AD01.

Research output: Contribution to journalArticle

Nitridation
Semiconductor quantum dots
Solar cells
solar cells
quantum dots
5 Citations (Scopus)

Effect of sulfur doped TiO2 on photovoltaic properties of dye-sensitized solar cells

Seo, H., Nam, S. H., Itagaki, N., Koga, K., Shiratani, M. & Boo, J. H., Jul 1 2016, In : Electronic Materials Letters. 12, 4, p. 530-536 7 p.

Research output: Contribution to journalArticle

Sulfur
Photocurrents
Charge transfer
Doping (additives)
Open circuit voltage
9 Citations (Scopus)

Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability

Toko, S., Torigoe, Y., Chen, W., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., Jan 1 2015, In : Thin Solid Films. 587, p. 126-131 6 p.

Research output: Contribution to journalArticle

silicon films
Amorphous silicon
amorphous silicon
cells
Degradation
4 Citations (Scopus)

Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor deposition

Kim, Y., Matsunaga, T., Nakahara, K., Uchida, G., Kamataki, K., Itagaki, N., Seo, H., Koga, K. & Shiratani, M., Nov 15 2012, In : Thin Solid Films. 523, p. 29-33 5 p.

Research output: Contribution to journalArticle

Microcrystalline silicon
silicon films
Chemical vapor deposition
vapor deposition
Nanoparticles
3 Citations (Scopus)

Effects of DC substrate bias voltage on dust flux in the Large Helical Device

Koga, K., Nishiyama, K., Morita, Y., Uchida, G., Yamashita, D., Kamataki, K., Seo, H., Itagaki, N., Shiratani, M., Ashikawa, N., Masuzaki, S., Nishimura, K. & Sagara, A., Jan 1 2013, In : Journal of Nuclear Materials. 438, SUPPL, p. S727-S730

Research output: Contribution to journalArticle

Bias voltage
Dust
dust
direct current
Fluxes
4 Citations (Scopus)

Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method

Dong, X., Koga, K., Yamashita, D., Seo, H., Itagaki, N., Shiratani, M., Setsuhara, Y., Sekine, M. & Hori, M., Jan 1 2016, In : Japanese Journal of Applied Physics. 55, 1, 01AA11.

Research output: Contribution to journalArticle

Plasma CVD
Ion bombardment
Deposition rates
bombardment
vapor deposition
4 Citations (Scopus)
Silanes
silanes
Dilution
dilution
Plasma CVD
23 Citations (Scopus)

Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation

Nakajima, A., Uchida, G., Kawasaki, T., Koga, K., Sarinont, T., Amano, T., Takenaka, K., Shiratani, M. & Setsuhara, Y., Jul 28 2015, In : Journal of Applied Physics. 118, 4, 043301.

Research output: Contribution to journalArticle

plasma jets
gas flow
liquid surfaces
oxidation
irradiation
5 Citations (Scopus)

Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films

Toko, S., Torigoe, Y., Keya, K., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., Jan 1 2016, In : Japanese Journal of Applied Physics. 55, 1, 01AA19.

Research output: Contribution to journalArticle

Deposition rates
gas flow
Flow of gases
flow velocity
Flow rate
82 Citations (Scopus)
gas temperature
Silanes
silanes
Discharge (fluid mechanics)
Thermal gradients
Open Access
vapor deposition
gases
plasma jets
hollow
deposits
10 Citations (Scopus)

Effects of hydrogen dilution on ZnO thin films fabricated via nitrogen-mediated crystallization

Suhariadi, I., Matsushima, K., Kuwahara, K., Oshikawa, K., Yamashita, D., Seo, H., Uchida, G., Kamataki, K., Koga, K., Shiratani, M., Bornholdt, S., Kersten, H., Wulff, H. & Itagaki, N., Jan 1 2013, In : Japanese journal of applied physics. 52, 1 PART2, 01AC08.

Research output: Contribution to journalArticle

Dilution
dilution
Crystallization
crystallization
Nitrogen
17 Citations (Scopus)

Effects of irradiation distance on supply of reactive oxygen species to the bottom of a Petri dish filled with liquid by an atmospheric O2/He plasma jet

Kawasaki, T., Kusumegi, S., Kudo, A., Sakanoshita, T., Tsurumaru, T., Sato, A., Uchida, G., Koga, K. & Shiratani, M., May 7 2016, In : Journal of Applied Physics. 119, 17, 173301.

Research output: Contribution to journalArticle

parabolic reflectors
plasma jets
irradiation
oxygen
liquids

Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

Kim, Y., Matsunaga, T., Nakahara, K., Seo, H., Kamataki, K., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., Aug 15 2013, In : Surface and Coatings Technology. 228, SUPPL.1

Research output: Contribution to journalArticle

Plasma CVD
plasma jets
hollow
vapor deposition
Nanoparticles
12 Citations (Scopus)

Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide

Suhariadi, I., Oshikawa, K., Kuwahara, K., Matsushima, K., Yamashita, D., Uchida, G., Koga, K., Shiratani, M. & Itagaki, N., Nov 1 2013, In : Japanese Journal of Applied Physics. 52, 11 PART 2, 11NB03.

Research output: Contribution to journalArticle

Crystal growth
crystal growth
Nitrogen
nitrogen
conduction
22 Citations (Scopus)

Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water

Uchida, G., Nakajima, A., Ito, T., Takenaka, K., Kawasaki, T., Koga, K., Shiratani, M. & Setsuhara, Y., Nov 28 2016, In : Journal of Applied Physics. 120, 20, 203302.

Research output: Contribution to journalArticle

plasma jets
liquid surfaces
irradiation
liquids
water
22 Citations (Scopus)

Effects of plasma irradiation using various feeding gases on growth of Raphanus sativus L.

Sarinont, T., Amano, T., Attri, P., Koga, K., Hayashi, N. & Shiratani, M., Sep 1 2016, In : Archives of Biochemistry and Biophysics. 605, p. 129-140 12 p.

Research output: Contribution to journalArticle

Raphanus
Gases
Irradiation
Plasma Gases
Plasmas
2 Citations (Scopus)

Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization

Iwasaki, K., Matsushima, K., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., Jan 1 2017, In : MRS Advances. 2, 5, p. 265-270 6 p.

Research output: Contribution to journalArticle

Crystallization
pressure dependence
gas pressure
Surface morphology
Sputtering
5 Citations (Scopus)

Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell

Seo, H., Son, M. K., Park, S., Jeong, M., Kim, H. J., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., Mar 3 2014, In : Thin Solid Films. 554, p. 122-126 5 p.

Research output: Contribution to journalArticle

Light scattering
solar cells
dyes
impedance
Electrolytes
11 Citations (Scopus)

Epitaxial growth of ZnInON films with tunable band gap from 1.7 to 3.3 eV on ZnO templates

Matsushima, K., Hirose, T., Kuwahara, K., Yamashita, D., Uchida, G., Seo, H., Kamataki, K., Koga, K., Shiratani, M. & Itagaki, N., Nov 1 2013, In : Japanese Journal of Applied Physics. 52, 11 PART 2, 11NM06.

Research output: Contribution to journalArticle

Epitaxial growth
Energy gap
templates
Crystallization
Nitrogen