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Research Output 1999 2020

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Article
2008
4 Citations (Scopus)

Temperature dependence of dielectric constant of nanoparticle composite porous low-k films fabricated by pulse radio frequency discharge with amplitude modulation

Iwashita, S., Morita, M., Matsuzaki, H., Koga, K. & Shiratani, M., Aug 22 2008, In : Japanese journal of applied physics. 47, 8 PART 3, p. 6875-6878 4 p.

Research output: Contribution to journalArticle

radio frequency discharge
Amplitude modulation
Permittivity
permittivity
Nanoparticles
10 Citations (Scopus)

Two-dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD

Nakamura, W. M., Miyahara, H., Sato, H., Matsuzaki, H., Koga, K. & Shiratani, M., Aug 1 2008, In : IEEE Transactions on Plasma Science. 36, 4 PART 1, p. 888-889 2 p.

Research output: Contribution to journalArticle

vapor deposition
nanoparticles
profiles
plasma jets
amorphous silicon
2007
6 Citations (Scopus)

A device for trapping nano-particles formed in processing plasmas for reduction of nano-waste

Iwashita, S., Koga, K. & Shiratani, M., Feb 26 2007, In : Surface and Coatings Technology. 201, 9-11 SPEC. ISS., p. 5701-5704 4 p.

Research output: Contribution to journalArticle

Plasma applications
trapping
Respiratory system
Stainless Steel
Deposits
1 Citation (Scopus)

Control of nanostructure of plasma CVD films for third generation photovoltaics

Shiratani, M., Nakamura, W. M., Miyahara, H. & Koga, K., Jun 1 2007, In : Journal of Physics: Conference Series. 86, 1, 012021.

Research output: Contribution to journalArticle

vapor deposition
amorphous silicon
reactors
degradation
production costs
17 Citations (Scopus)
Amplitude modulation
Electric potential
electric potential
Modulation
Light scattering
53 Citations (Scopus)

Single step method to deposit Si quantum dot films using H2 + SiH4 VHF discharges and electron mobility in a Si quantum dot solar cell

Shiratani, M., Koga, K., Ando, S., Inoue, T., Watanabe, Y., Nunomura, S. & Kondo, M., Feb 26 2007, In : Surface and Coatings Technology. 201, 9-11 SPEC. ISS., p. 5468-5471 4 p.

Research output: Contribution to journalArticle

Electron mobility
electron mobility
Semiconductor quantum dots
Solar cells
Deposits
25 Citations (Scopus)
Amplitude modulation
Plasma sheaths
Electric potential
electric potential
Electrodes
2006
33 Citations (Scopus)

In situ simple method for measuring size and density of nanoparticles in reactive plasmas

Nunomura, S., Kita, M., Koga, K., Shiratani, M. & Watanabe, Y., May 25 2006, In : Journal of Applied Physics. 99, 8, 083302.

Research output: Contribution to journalArticle

nanoparticles
light scattering
coagulation
lasers
radio frequency discharge
14 Citations (Scopus)

Mechanism of Cu deposition from Cu(EDMDD)2 using H-assisted plasma CVD

Takenaka, K., Koga, K., Shiratani, M., Watanabe, Y. & Shingen, T., May 26 2006, In : Thin Solid Films. 506-507, p. 197-201 5 p.

Research output: Contribution to journalArticle

Plasma CVD
vapor deposition
Surface reactions
in situ measurement
surface reactions
1 Citation (Scopus)

Nano-particle formation due to interaction between H2 plasma and carbon wall

Koga, K., Kitaura, Y., Shiratani, M., Watanabe, Y. & Komori, A., May 26 2006, In : Thin Solid Films. 506-507, p. 656-659 4 p.

Research output: Contribution to journalArticle

Beam plasma interactions
Carbon
Plasmas
carbon
interactions
29 Citations (Scopus)

Production of crystalline Si nano-clusters using pulsed H2 + SiH4 VHF discharges

Kakeya, T., Koga, K., Shiratani, M., Watanabe, Y. & Kondo, M., May 26 2006, In : Thin Solid Films. 506-507, p. 288-291 4 p.

Research output: Contribution to journalArticle

Crystalline materials
Heating
Temperature
crystallinity
Substrates
14 Citations (Scopus)

Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges

Shiratani, M., Koga, K., Kaguchi, N., Bando, K. & Watanabe, Y., May 26 2006, In : Thin Solid Films. 506-507, p. 17-21 5 p.

Research output: Contribution to journalArticle

Silanes
silanes
Diodes
configurations
Plasma CVD
2005
11 Citations (Scopus)

Control of deposition profile of copper for large-scale integration (LSI) interconnects by plasma chemical vapor deposition

Takenaka, K., Shiratani, M., Takeshita, M., Kita, M., Koga, K. & Watanabe, Y., Feb 1 2005, In : Pure and Applied Chemistry. 77, 2, p. 391-398 8 p.

Research output: Contribution to journalArticle

LSI circuits
Copper
Chemical vapor deposition
Plasmas
Ion bombardment
41 Citations (Scopus)

Fabrication of nanoparticle composite porous films having ultralow dielectric constant

Nunomura, S., Koga, K., Shiratani, M., Watanabe, Y., Morisada, Y., Matsuki, N. & Ikeda, S., Dec 16 2005, In : Japanese Journal of Applied Physics, Part 2: Letters. 44, 50-52, p. L1509-L1511

Research output: Contribution to journalArticle

Permittivity
permittivity
Nanoparticles
Fabrication
nanoparticles
52 Citations (Scopus)

Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition

Koga, K., Indue, T., Bando, K., Iwashita, S., Shiratani, M. & Watanabe, Y., Nov 25 2005, In : Japanese Journal of Applied Physics, Part 2: Letters. 44, 46-49, p. L1430-L1432

Research output: Contribution to journalArticle

Chemical vapor deposition
hollow
vapor deposition
Plasmas
Defect density
2004
8 Citations (Scopus)

Anisotropic deposition of Cu in trenches by H-assisted plasma chemical vapor deposition

Takenaka, K., Kita, M., Kinoshita, T., Koga, K., Shiratani, M. & Watanabe, Y., Jul 1 2004, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 22, 4, p. 1903-1907 5 p.

Research output: Contribution to journalArticle

Chemical vapor deposition
vapor deposition
Plasmas
Deposition rates
Impurities
8 Citations (Scopus)

Carbon particle formation due to interaction between H2 plasma and carbon fiber composite wall

Koga, K., Uehara, R., Kitaura, Y., Shiratani, M., Watanabe, Y. & Komori, A., Apr 1 2004, In : IEEE Transactions on Plasma Science. 32, 2 I, p. 405-409 5 p.

Research output: Contribution to journalArticle

fiber composites
carbon fibers
fibers
carbon
interactions
37 Citations (Scopus)
Hydrogen
Volume fraction
hydrogen
Plasma CVD
reactors
2003
4 Citations (Scopus)
Silanes
silanes
Dilution
dilution
Plasma CVD
2002
10 Citations (Scopus)

Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Takenaka, K., Shiratani, M., Onishi, M., Takeshita, M., Kinoshita, T., Koga, K. & Watanabe, Y., Apr 1 2002, In : Materials Science in Semiconductor Processing. 5, 2-3, p. 301-304 4 p.

Research output: Contribution to journalArticle

Copper
Chemical vapor deposition
vapor deposition
Plasmas
copper
11 Citations (Scopus)

Clustering phenomena in low-pressure reactive plasmas. Basis and applications

Watanabe, Y., Shiratani, M. & Koga, K., Jan 1 2002, In : Pure and Applied Chemistry. 74, 3, p. 483-487 5 p.

Research output: Contribution to journalArticle

Flow of gases
Plasmas
Dilution
Hydrogen
Gases
44 Citations (Scopus)
silicon films
Amorphous silicon
amorphous silicon
Chemical vapor deposition
vapor deposition
2001
19 Citations (Scopus)

Formation kinetics and control of dust particles in capacitively-coupled reactive plasmas

Watanabe, Y., Shiratani, M. & Koga, K., Dec 1 2001, In : Physica Scripta T. 89, p. 29-32 4 p.

Research output: Contribution to journalArticle

Plasma
dust
Kinetics
electrode
plasma
18 Citations (Scopus)

H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration

Shiratani, M., Jin, H. J., Takenaka, K., Koga, K., Kinoshita, T. & Watanabe, Y., Sep 12 2001, In : Science and Technology of Advanced Materials. 2, 3-4, p. 505-515 11 p.

Research output: Contribution to journalArticle

ULSI circuits
Plasma CVD
Deposits
Surface roughness
Irradiation
2000
82 Citations (Scopus)
gas temperature
Silanes
silanes
Discharge (fluid mechanics)
Thermal gradients
1 Citation (Scopus)
Copper
Plasmas
Atoms
Surface reactions
Chemical vapor deposition
2 Citations (Scopus)

H assisted control of quality and conformality in Cu film deposition using plasma CVD method

Shiratani, M., Jin, H. J., Takenaka, K., Koga, K., Kinoshita, T. & Watanabe, Y., 2000, In : Unknown Journal. p. 271-278 8 p.

Research output: Contribution to journalArticle

Plasma CVD
plasma
trench
Hydrogen
hydrogen
71 Citations (Scopus)

In situ observation of nucleation and subsequent growth of clusters in silane radio frequency discharges

Koga, K., Matsuoka, Y., Tanaka, K., Shiratani, M. & Watanabe, Y., Jul 10 2000, In : Applied Physics Letters. 77, 2, p. 196-198 3 p.

Research output: Contribution to journalArticle

radio frequency discharge
silanes
nucleation
in situ measurement
low pressure
6 Citations (Scopus)

Propagation characteristics of ion acoustic waves in an Ar/SF6 plasma

Ichiki, R., Shindo, M., Yoshimura, S., Koga, K. & Kawai, Y., Jun 2000, In : Journal of the Physical Society of Japan. 69, 6, p. 1925-1926 2 p.

Research output: Contribution to journalArticle

ion acoustic waves
mass spectroscopy
propagation
1999
7 Citations (Scopus)

Behavior of the ion sheath instability in a negative ion plasma

Koga, K. & Kawai, Y., Dec 1 1999, In : Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 38, 3 A, p. 1553-1557 5 p.

Research output: Contribution to journalArticle

ion sheaths
Plasma sheaths
Plasma stability
negative ions
Negative ions
5 Citations (Scopus)

Observation of local structures in asymmetric ion sheath

Koga, K., Naitou, H. & Kawai, Y., Jan 1 1999, In : Journal of the Physical Society of Japan. 68, 5, p. 1578-1584 7 p.

Research output: Contribution to journalArticle

ion sheaths
sheaths
saturation
ion motion
profiles