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Research Output 1999 2019

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Review article
2019

Progress and perspectives in dry processes for emerging multidisciplinary applications: How can we improve our use of dry processes?

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0803.

Research output: Contribution to journalReview article

emerging
Plasmas
Atmospheric pressure
atmospheric pressure
multidisciplinary research

Progress and perspectives in dry processes for leading-edge manufacturing of devices: Toward intelligent processes and virtual product development

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0804.

Research output: Contribution to journalReview article

product development
leading edges
Product development
manufacturing
Plasmas

Progress and perspectives in dry processes for nanoscale feature fabrication: Fine pattern transfer and high-aspect-ratio feature formation

Iwase, T., Kamaji, Y., Kang, S. Y., Koga, K., Kuboi, N., Nakamura, M., Negishi, N., Nozaki, T., Nunomura, S., Ogawa, D., Omura, M., Shimizu, T., Shinoda, K., Sonoda, Y., Suzuki, H., Takahashi, K., Tsutsumi, T., Yoshikawa, K., Ishijima, T. & Ishikawa, K., Jan 1 2019, In : Japanese Journal of Applied Physics. 58, SE, SE0802.

Research output: Contribution to journalReview article

high aspect ratio
Aspect ratio
Fabrication
fabrication
semiconductor devices
2010
57 Citations (Scopus)

Review of pulmonary toxicity of indium compounds to animals and humans

Tanaka, A., Hirata, M., Kiyohara, Y., Nakano, M., Omae, K., Shiratani, M. & Koga, K., Mar 31 2010, In : Thin Solid Films. 518, 11, p. 2934-2936 3 p.

Research output: Contribution to journalReview article

Indium compounds
indium compounds
toxicity
Toxicity
animals
2005
17 Citations (Scopus)

Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition

Koga, K., Kaguchi, N., Bando, K., Shiratani, M. & Watanabe, Y., Dec 12 2005, In : Review of Scientific Instruments. 76, 11, p. 1-4 4 p., 113501.

Research output: Contribution to journalReview article

Chemical vapor deposition
vapor deposition
Plasmas
filters
Hydrogen