Physics
Thin Films
68%
Targets
59%
Pulsed Laser Deposition
32%
Deposition
31%
Gases
30%
Substrates
29%
ZnO
24%
Laser
24%
Molecules
19%
Quartz
19%
Excimer Laser
17%
Fluence
16%
YAG Laser
16%
Laser Deposition
16%
Hydrogen
16%
Gas Pressure
13%
Ratios
13%
Ethylene
12%
Methane
11%
Silicon
11%
Plum
11%
Nitrogen
10%
Temperature
10%
Electroluminescence
10%
Pressure
9%
Electric Potential
9%
Behavior
9%
Increasing
9%
Optical Spectrum
8%
Magnetron Sputtering
8%
Electron Density
8%
X Ray Spectroscopy
8%
Gas Mixture
8%
Metal
8%
Ablation
8%
X-Ray Diffraction
7%
Oxygen
7%
Hydrocarbon
7%
Magnetic Fields
7%
Liquids
7%
Heating
6%
Optical Emission Spectroscopy
6%
Liquid Helium
6%
Platinum
6%
Nitride
6%
Ozone
6%
Tantalum
6%
Plasma Process
6%
Nanomaterial
6%
Titanium Carbide
6%
Material Science
Thin Films
100%
Film
81%
Gas
39%
Powder
32%
Titanium Dioxide
18%
ZnO
15%
Nickel
12%
Silicon
11%
Temperature
10%
X-Ray Diffraction
10%
Pulsed Laser Deposition
10%
Crystalline Material
8%
Structural Property
8%
Carrier Concentration
8%
Material
8%
Irradiation
7%
Carbon Films
7%
Stainless Steel
7%
Zinc Oxide
7%
Laser
7%
Plasma Coating
6%
Surface
6%
Indium Tin Oxide
6%
Nanostructure
6%
Coil
6%
Rod
6%
Hydroxylapatite
6%
Cylinder
6%
Permalloy
6%
Cubic Boron Nitride
6%
Bismuth
6%
Iron
6%
Mixture
5%
Elastic Deformation
5%
Surface Morphology
5%
Al2O3
5%
Gas Mixture
5%
Hardness
5%
Chemistry
Pulsed Laser Deposition
43%
Procedure
43%
Gas
27%
Liquid Film
24%
X-Ray Diffraction
15%
Molecule
14%
Nitrogen
13%
Indium
12%
Rate
10%
Titanium Dioxide
10%
Dioxygen
10%
Thin Film Processing Method
9%
Phase Composition
9%
Irradiation
9%
Crystalline Material
9%
Zinc Oxide
9%
Electron Density
8%
Pressure
8%
Titanium Oxide
8%
Optical Emission Spectroscopy
7%
Reaction Temperature
6%
Atomic Force Microscopy
6%
Deposition Technique
6%
Crystal Structure
6%
Hydrogen Production
6%
Hydrophilicity
6%
Nitride
6%
Gallium
6%
Tungsten Oxide
5%
Atom
5%
Laser Ablation
5%
Mixture
5%
Chemical Reaction
5%
Surface
5%
Time
5%
Tin Oxide
5%