Physics
Ablation
9%
Behavior
9%
Deposition
31%
Diamonds
6%
Electric Potential
9%
Electroluminescence
10%
Electron Density
8%
Ethylene
11%
Excimer Laser
16%
Fluence
16%
Gas Mixture
7%
Gas Pressure
13%
Gases
30%
Heating
6%
Hydrocarbon
7%
Hydrogen
16%
Images
6%
Increasing
9%
Laser
30%
Laser Deposition
16%
Liquid Helium
5%
Liquids
7%
Magnetic Fields
7%
Magnetron Sputtering
8%
Metal
7%
Methane
11%
Molecules
23%
Nitride
5%
Nitrogen
10%
Optical Emission Spectroscopy
8%
Oxygen
7%
Ozone
5%
Plasma Process
5%
Platinum
5%
Plum
14%
Pressure
9%
Pulsed Laser Deposition
36%
Quartz
19%
Ratios
13%
Silicon
10%
Spectra
8%
Substrates
33%
Tantalum
5%
Targets
58%
Temperature
14%
Thin Films
69%
X Ray Spectroscopy
7%
X-Ray Diffraction
12%
YAG Laser
16%
ZnO
24%
Material Science
Al2O3
5%
Bismuth
5%
Carbon Films
7%
Carrier Concentration
8%
Coil
5%
Crystalline Material
8%
Cubic Boron Nitride
5%
Cylinder
5%
Elastic Deformation
5%
Gallium
5%
Gas
39%
Indium
5%
Indium Tin Oxide
5%
Iron
5%
Irradiation
6%
Laser
6%
Liquid Films
97%
Material
8%
Mixture
5%
Nanocrystalline Material
5%
Nickel
11%
Permalloy
5%
Plasma Coating
6%
Powder
31%
Pulsed Laser Deposition
10%
Rod
5%
Silicon
10%
Stainless Steel
7%
Structural Property
8%
Surface
5%
Surface Morphology
5%
Temperature
10%
Thin Films
100%
Titanium Dioxide
11%
X-Ray Diffraction
10%
Zinc Oxide
6%
ZnO
14%
Chemistry
Atom
5%
Atomic Force Microscopy
6%
Chemical Reaction
5%
Crystal Structure
5%
Crystalline Material
8%
Deposition Technique
6%
Dioxygen
10%
Electron Density
8%
Gas
27%
Hydrogen Production
5%
Hydrophilicity
5%
Indium
5%
Irradiation
8%
Laser Ablation
5%
Liquid Film
76%
Metal
7%
Mixture
5%
Molecule
14%
Nitride
5%
Nitrogen
13%
Optical Emission Spectroscopy
7%
Phase Composition
9%
Pressure
8%
Procedure
39%
Pulsed Laser Deposition
41%
Rate
11%
Reaction Temperature
9%
Surface
5%
Thin Film Processing Method
8%
Titanium Dioxide
10%
Titanium Oxide
7%
X-Ray Diffraction
15%
Zinc Oxide
8%