TY - GEN
T1 - 6.3 eV duv generation based on microchip Nd
T2 - Laser Ignition Conference, LIC 2017
AU - Oki, Yuji
AU - Ohe, Takashi
AU - Yoshioka, Hiroaki
AU - Kosaka, Koji
AU - Kanemaru, Takaaki
N1 - Publisher Copyright:
© OSA 2017.
PY - 2017
Y1 - 2017
N2 - Deep ultraviolet light source using passively Q-switch Nd:YAG laser was proposed and designed for soft laser ablation on scanning electron microscopic application. Design wavelength is from 193 nm to 196.7 nm that exceeds 6.3 eV in photon energy for chemical dissociation of organic sample. Frequency mixing of 4th harmonic beam and optical parametric generated red beam are adopted by using flux-less BBO crystal. Initial design of BBO and PPLN-OPG has been performed.
AB - Deep ultraviolet light source using passively Q-switch Nd:YAG laser was proposed and designed for soft laser ablation on scanning electron microscopic application. Design wavelength is from 193 nm to 196.7 nm that exceeds 6.3 eV in photon energy for chemical dissociation of organic sample. Frequency mixing of 4th harmonic beam and optical parametric generated red beam are adopted by using flux-less BBO crystal. Initial design of BBO and PPLN-OPG has been performed.
UR - http://www.scopus.com/inward/record.url?scp=85035132517&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85035132517&partnerID=8YFLogxK
U2 - 10.1364/LIC.2017.LWA5.10
DO - 10.1364/LIC.2017.LWA5.10
M3 - Conference contribution
AN - SCOPUS:85035132517
T3 - Optics InfoBase Conference Papers
BT - Laser Ignition Conference, LIC 2017
PB - OSA - The Optical Society
Y2 - 20 July 2017 through 23 July 2017
ER -