6.3 eV duv generation based on microchip Nd: YAG laser

Yuji Oki, Takashi Ohe, Hiroaki Yoshioka, Koji Kosaka, Takaaki Kanemaru

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Deep ultraviolet light source using passively Q-switch Nd:YAG laser was proposed and designed for soft laser ablation on scanning electron microscopic application. Design wavelength is from 193 nm to 196.7 nm that exceeds 6.3 eV in photon energy for chemical dissociation of organic sample. Frequency mixing of 4th harmonic beam and optical parametric generated red beam are adopted by using flux-less BBO crystal. Initial design of BBO and PPLN-OPG has been performed.

Original languageEnglish
Title of host publicationLaser Ignition Conference, LIC 2017
PublisherOSA - The Optical Society
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - Jan 1 2017
EventLaser Ignition Conference, LIC 2017 - Bucharest, Romania
Duration: Jul 20 2017Jul 23 2017

Publication series

NameOptics InfoBase Conference Papers
VolumePart F67-LIC 2017

Conference

ConferenceLaser Ignition Conference, LIC 2017
CountryRomania
CityBucharest
Period7/20/177/23/17

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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  • Cite this

    Oki, Y., Ohe, T., Yoshioka, H., Kosaka, K., & Kanemaru, T. (2017). 6.3 eV duv generation based on microchip Nd: YAG laser. In Laser Ignition Conference, LIC 2017 (Optics InfoBase Conference Papers; Vol. Part F67-LIC 2017). OSA - The Optical Society. https://doi.org/10.1364/LIC.2017.LWA5.10