8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave

Ryota Hidaka, Toru Yamaguchi, Nobuyoshi Hirotsu, Takaharu Ohshima, Ryuji Koga, Masayoshi Tanaka, Yoshinobu Kawai

    Research output: Contribution to journalArticle

    27 Citations (Scopus)

    Abstract

    A new type of electron cyclotron resonance (ECR) plasma source has been developed using a circular TE01 mode microwave converted from the principal TE10 rectangular mode. The ion saturation current density of 36 mA/cm2 is achieved for the input microwave power of 3 kW at the nitrogen gas pressure of 5 x 10-4 Torr. The uniformity of the ion saturation current density is within ±3% over 8 inches in diameter, which is better than that produced by a conventional TE11 mode microwave. The mean ion energy at the substrate position in this ECR plasma source is in the range of 20-30 eV, depending on the shape of magnetic fields. The direction of ion motion is confirmed by etching test to be almost perpendicular to the wafer and to be useful for fabricating ULSI circuits on wafers larger than 6 inches in diameter.

    Original languageEnglish
    Pages (from-to)174-178
    Number of pages5
    JournalJapanese journal of applied physics
    Volume32
    Issue number1 R
    DOIs
    Publication statusPublished - Jan 1993

    All Science Journal Classification (ASJC) codes

    • Engineering(all)
    • Physics and Astronomy(all)

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  • Cite this

    Hidaka, R., Yamaguchi, T., Hirotsu, N., Ohshima, T., Koga, R., Tanaka, M., & Kawai, Y. (1993). 8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave. Japanese journal of applied physics, 32(1 R), 174-178. https://doi.org/10.1143/JJAP.32.174