A CP mask development methodology for MCC systems

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Yusuke Matsunaga, Kazuaki Murakami

Research output: Contribution to journalConference articlepeer-review

8 Citations (Scopus)

Abstract

The character projection (CP) is utilized for maskless lithography and is a potential for the future photomask manufacture because the CP can project ICs faster than the point beam projection and the variable-shaped beam (VSB) projection. The drawback of the CP is its lower throughput than that of photomask-based lithography and the amortization cost of CP equipment leads to the price rise of ICs. This paper discusses a CP mask development methodology for increasing the throughput of MCC systems. The proposed methodology virtually increases the number of the logic cells which are projected with the CP. In the proposed methodology, the multiform CP masks are utilized among the column-cells for reducing the VSB projection. The experimental results show that the proposed CP mask development methodology reduced 71.3% of the number of EB shots needed for an SCC system. It also reduced 42.6% of the number of EB shots needed for the MCC system in which uniform CP masks are utilized for all column-cells.

Original languageEnglish
Article number62833J
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume6283 II
DOIs
Publication statusPublished - 2006
EventPhotomask and Next-Generation Lithography Mask Technology XIII - Yokohama, Japan
Duration: Apr 18 2006Apr 20 2006

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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