Abstract
A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
| Original language | English |
|---|---|
| Pages (from-to) | L1385-L1388 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 28 |
| Issue number | 8 A |
| DOIs | |
| Publication status | Published - Aug 1 1989 |
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)
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Kisu, T., Ariyoshi, Y., Enpuku, K., Yoshida, K., Takeo, M., & Yamafuji, K. (1989). A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films. Japanese Journal of Applied Physics, 28(8 A), L1385-L1388. https://doi.org/10.1143/JJAP.28.L1385