TY - JOUR
T1 - A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films
AU - Kisu, Takanobu
AU - Ariyoshi, Yuji
AU - Enpuku, Keiji
AU - Yoshida, Keiji
AU - Takeo, Masakatsu
AU - Yamafuji, Kaoru
PY - 1989/8/1
Y1 - 1989/8/1
N2 - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
AB - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
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U2 - 10.1143/JJAP.28.L1385
DO - 10.1143/JJAP.28.L1385
M3 - Article
AN - SCOPUS:0024718566
VL - 28
SP - L1385-L1388
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 8 A
ER -