Abstract
A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
| Original language | English |
|---|---|
| Pages (from-to) | L1385-L1388 |
| Journal | Japanese Journal of Applied Physics |
| Volume | 28 |
| Issue number | 8 A |
| DOIs | |
| Publication status | Published - Aug 1 1989 |
Fingerprint
All Science Journal Classification (ASJC) codes
- Engineering(all)
- Physics and Astronomy(all)
Cite this
A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films. / Kiss, Takanobu; Ariyoshi, Yuji; Enpuku, Keiji; Yoshida, Keiji; Takeo, Masakatsu; Yamafuji, Kaoru.
In: Japanese Journal of Applied Physics, Vol. 28, No. 8 A, 01.08.1989, p. L1385-L1388.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films
AU - Kiss, Takanobu
AU - Ariyoshi, Yuji
AU - Enpuku, Keiji
AU - Yoshida, Keiji
AU - Takeo, Masakatsu
AU - Yamafuji, Kaoru
PY - 1989/8/1
Y1 - 1989/8/1
N2 - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
AB - A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
UR - http://www.scopus.com/inward/record.url?scp=0024718566&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0024718566&partnerID=8YFLogxK
U2 - 10.1143/JJAP.28.L1385
DO - 10.1143/JJAP.28.L1385
M3 - Article
AN - SCOPUS:0024718566
VL - 28
SP - L1385-L1388
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 8 A
ER -