A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films

Takanobu Kiss, Yuji Ariyoshi, Keiji Enpuku, Keiji Yoshida, Masakatsu Takeo, Kaoru Yamafuji

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.

Original languageEnglish
Pages (from-to)L1385-L1388
JournalJapanese Journal of Applied Physics
Volume28
Issue number8 A
DOIs
Publication statusPublished - Aug 1 1989

Fingerprint

Sputter deposition
Anodes
anodes
Thin films
Electrodes
electrodes
Charged particles
thin films
critical current
charged particles
current density
damage

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films. / Kiss, Takanobu; Ariyoshi, Yuji; Enpuku, Keiji; Yoshida, Keiji; Takeo, Masakatsu; Yamafuji, Kaoru.

In: Japanese Journal of Applied Physics, Vol. 28, No. 8 A, 01.08.1989, p. L1385-L1388.

Research output: Contribution to journalArticle

Kiss, Takanobu ; Ariyoshi, Yuji ; Enpuku, Keiji ; Yoshida, Keiji ; Takeo, Masakatsu ; Yamafuji, Kaoru. / A new anode-electrode structure for sputter deposition of high-quality y-ba-cu-o thin films. In: Japanese Journal of Applied Physics. 1989 ; Vol. 28, No. 8 A. pp. L1385-L1388.
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