A new structure of the anode electrode is presented for sputter deposition of Y-Ba-Cu-O thin films. The present anode electrode is expected to reduce the damage due to charged particles incident on the film surface. Using this method, high-quality films with very smooth surfaces and critical current density as large as jC(4.2 K)=2.1×107A/cm2can be obtained reproducibly.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)