A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

D. Sasaguri; T. Asano

doi:10.1109/IMNC.1998.729970

A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

D. Sasaguri, T. Asano

Center for Japan-Egypt Cooperation in Science and Technology（E-JUST Center）

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication	1998 International Microprocesses and Nanotechnology Conference
Editors	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	71-72
Number of pages	2
ISBN (Electronic)	4930813832, 9784930813831
DOIs	https://doi.org/10.1109/IMNC.1998.729970
Publication status	Published - 1998
Event	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of Duration: Jul 13 1998 → Jul 16 1998

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume	1998-July

Other

Other	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
Country/Territory	Korea, Republic of
City	Kyoungju
Period	7/13/98 → 7/16/98

All Science Journal Classification (ASJC) codes

Materials Science(all)
Nuclear and High Energy Physics
Computer Science Applications

Access to Document

10.1109/IMNC.1998.729970

Cite this

Sasaguri, D., & Asano, T. (1998). A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 71-72). [729970] (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.729970

A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. / Sasaguri, D.; Asano, T.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 71-72 729970 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Sasaguri, D & Asano, T 1998, A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 729970, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 71-72, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 7/13/98. https://doi.org/10.1109/IMNC.1998.729970

Sasaguri D, Asano T. A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 71-72. 729970. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). doi: 10.1109/IMNC.1998.729970

Sasaguri, D. ; Asano, T. / A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 71-72 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

@inproceedings{ffb9401170374a7a983c4ba85e7480ba,

title = "A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation",

author = "D. Sasaguri and T. Asano",

year = "1998",

doi = "10.1109/IMNC.1998.729970",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "71--72",

editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",

address = "United States",

note = "1998 International Microprocesses and Nanotechnology Conference, MNC 1998 ; Conference date: 13-07-1998 Through 16-07-1998",

}

TY - GEN

T1 - A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

AU - Sasaguri, D.

AU - Asano, T.

PY - 1998

Y1 - 1998

UR - http://www.scopus.com/inward/record.url?scp=85051413745&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051413745&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.729970

DO - 10.1109/IMNC.1998.729970

M3 - Conference contribution

AN - SCOPUS:85051413745

T3 - Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference

SP - 71

EP - 72

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 1998 International Microprocesses and Nanotechnology Conference, MNC 1998

Y2 - 13 July 1998 through 16 July 1998

ER -

A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

Publication series

Other

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Cite this