A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

D. Sasaguri, Tanemasa Asano

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication1998 International Microprocesses and Nanotechnology Conference
EditorsHyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages71-72
Number of pages2
ISBN (Electronic)4930813832, 9784930813831
DOIs
Publication statusPublished - Jan 1 1998
Externally publishedYes
Event1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of
Duration: Jul 13 1998Jul 16 1998

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume1998-July

Other

Other1998 International Microprocesses and Nanotechnology Conference, MNC 1998
CountryKorea, Republic of
CityKyoungju
Period7/13/987/16/98

Fingerprint

hydrogen ions
Delamination
Ion implantation
ion implantation
emitters
Fabrication
Silicon
Hydrogen
fabrication
silicon

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Nuclear and High Energy Physics
  • Computer Science Applications

Cite this

Sasaguri, D., & Asano, T. (1998). A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 71-72). [729970] (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.729970

A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. / Sasaguri, D.; Asano, Tanemasa.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 71-72 729970 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sasaguri, D & Asano, T 1998, A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 729970, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 71-72, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 7/13/98. https://doi.org/10.1109/IMNC.1998.729970
Sasaguri D, Asano T. A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 71-72. 729970. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). https://doi.org/10.1109/IMNC.1998.729970
Sasaguri, D. ; Asano, Tanemasa. / A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 71-72 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).
@inproceedings{ffb9401170374a7a983c4ba85e7480ba,
title = "A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation",
author = "D. Sasaguri and Tanemasa Asano",
year = "1998",
month = "1",
day = "1",
doi = "10.1109/IMNC.1998.729970",
language = "English",
series = "Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "71--72",
editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",
address = "United States",

}

TY - GEN

T1 - A new fabrication process of field emitter arrays using silicon delamination by hydrogen ion implantation

AU - Sasaguri, D.

AU - Asano, Tanemasa

PY - 1998/1/1

Y1 - 1998/1/1

UR - http://www.scopus.com/inward/record.url?scp=85051413745&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051413745&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.729970

DO - 10.1109/IMNC.1998.729970

M3 - Conference contribution

T3 - Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference

SP - 71

EP - 72

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

ER -