A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator

Tsuyohiko Fujigaya, Yuji Shibasaki, Mitsuru Ueda

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

A simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5- benzenetetracarboxylate (4) was prepared from 1,3,5-benzenetricarbonyl trichloride (3) and 3,5-di(tert-butoxycarbonyloxy)benzyl alcohol (2). Compound 4 can form an uniform transparent film by spin-casting on silicone wafer and the film has a good transparency above 300 nm wavelength. The chemically amplified photoresist system based on 4 containing 5 wt% of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ/cm2 and a contrast of 17 with 365 nm light.

Original languageEnglish
Pages (from-to)275-280
Number of pages6
JournalJournal of Photopolymer Science and Technology
Volume14
Issue number2
DOIs
Publication statusPublished - Jan 1 2001
Externally publishedYes

Fingerprint

Photoresists
Benzyl Alcohol
Molecules
Silicones
Transparency
Casting
Alcohols
Wavelength
trimesic acid
1,3,5-benzene-tricarbonyl trichloride
diphenyliodonium
9,10-dimethoxyanthracene-2-sulfonate

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

Cite this

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abstract = "A simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5- benzenetetracarboxylate (4) was prepared from 1,3,5-benzenetricarbonyl trichloride (3) and 3,5-di(tert-butoxycarbonyloxy)benzyl alcohol (2). Compound 4 can form an uniform transparent film by spin-casting on silicone wafer and the film has a good transparency above 300 nm wavelength. The chemically amplified photoresist system based on 4 containing 5 wt{\%} of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS) showed a sensitivity of 19 mJ/cm2 and a contrast of 17 with 365 nm light.",
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T1 - A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator

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AU - Shibasaki, Yuji

AU - Ueda, Mitsuru

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