A new positive working alkaline developable photoresist based on a simple amorphous molecule, tri(3,5-di-tert-butoxycarbonyloxybenzyl) 1,3,5-benzenetricarboxylate and a photoacid generator

Tsuyohiko Fujigaya, Yuji Shibasaki, Mitsuru Ueda

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science