A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems

Akio Higo, K. Takahashi, H. Fujita, Y. Nakano, H. Toshiyoshi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We have developed novel mask materials against HF Vapor release for MEMS/NEMS. Parylene-C has a tolerant material against moisture pass, and then, thin aluminum layer has also tolerant against HF vapor. We combined them together for high tolerance and we have successfully obtained completely non-etched silicon oxide layer under HF vapor exposure by Parylene/Al/Parylene sandwich structure.

Original languageEnglish
Title of host publicationTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages196-199
Number of pages4
DOIs
Publication statusPublished - Dec 11 2009
Externally publishedYes
EventTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems - Denver, CO, United States
Duration: Jun 21 2009Jun 25 2009

Publication series

NameTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Other

OtherTRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
CountryUnited States
CityDenver, CO
Period6/21/096/25/09

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All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Higo, A., Takahashi, K., Fujita, H., Nakano, Y., & Toshiyoshi, H. (2009). A novel Parylene/Al/Parylene sandwich protection mask for HF vapor release for micro electro mechanical systems. In TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems (pp. 196-199). [5285531] (TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems). https://doi.org/10.1109/SENSOR.2009.5285531