TY - JOUR
T1 - A quantum chemical study on hydrogen radical reactions with methane and silane
AU - Sato, Kota
AU - Kojima, Kuniharu
AU - Kawasaki, Masashi
AU - Matsuzaki, Yoshio
AU - Hirano, Tsuneo
AU - Nakano, Masatake
AU - Koinuma, Hideomi
PY - 1989
Y1 - 1989
N2 - A quantum chemical study on the reaction of CH4, CF4, SiH4, and SiF4 with a hydrogen radical is performed on the basis of an ab initio molecular orbital calculation to predict the photochemical reactivity of methane, silane, and their analogues. The transition state geometry of the reactions is determined by employing a 3-21G basis set. The total energies of reactant molecules at the initial, transition, and final states are calculated by employing a 6-31G** basis set. The exponential parts of the rate constants of these reactions determined from these energies on the basis of the transition state theory are in good agreement with the experimentally obtained relative rates of the reaction. The present calculation was consistent with the experimental results of photochemical reactions for methane and silane derivatives.
AB - A quantum chemical study on the reaction of CH4, CF4, SiH4, and SiF4 with a hydrogen radical is performed on the basis of an ab initio molecular orbital calculation to predict the photochemical reactivity of methane, silane, and their analogues. The transition state geometry of the reactions is determined by employing a 3-21G basis set. The total energies of reactant molecules at the initial, transition, and final states are calculated by employing a 6-31G** basis set. The exponential parts of the rate constants of these reactions determined from these energies on the basis of the transition state theory are in good agreement with the experimentally obtained relative rates of the reaction. The present calculation was consistent with the experimental results of photochemical reactions for methane and silane derivatives.
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U2 - 10.1063/1.342866
DO - 10.1063/1.342866
M3 - Article
AN - SCOPUS:0042911193
VL - 65
SP - 2145
EP - 2146
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 5
ER -