A study of ion velocity distribution functions in processing plasmas produced by electron cyclotron resonance discharges

W. Cronrath, N. Mayumi, M. D. Bowden, K. Uchino, K. Muraoka, M. Yoshida

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Ion velocity distribution functions were measured using Doppler-shifted laser-induced fluorescence spectroscopy in an electron cyclotron resonance discharge in argon. The influence of the magnetic field configuration on the distributions was studied by making measurements with different magnetic field configurations. Results of a two-dimensional hybrid model of the discharge were used to help interpret the measured data. The results from the experiment and the simulation indicated that the magnetic field configuration had a strong influence on the ion velocity distribution functions. From the simulation it was concluded that the magnetic field configuration determined the axial distributions of plasma potential and electron density, and how these plasma parameters determined the ion velocity distribution function in the downstream region of the discharge.

Original languageEnglish
Pages (from-to)1036-1041
Number of pages6
JournalJournal of Applied Physics
Volume82
Issue number3
DOIs
Publication statusPublished - Aug 1 1997

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magnetic field configurations
electron cyclotron resonance
velocity distribution
distribution functions
ions
plasma potentials
laser induced fluorescence
simulation
argon
spectroscopy

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

A study of ion velocity distribution functions in processing plasmas produced by electron cyclotron resonance discharges. / Cronrath, W.; Mayumi, N.; Bowden, M. D.; Uchino, K.; Muraoka, K.; Yoshida, M.

In: Journal of Applied Physics, Vol. 82, No. 3, 01.08.1997, p. 1036-1041.

Research output: Contribution to journalArticle

Cronrath, W. ; Mayumi, N. ; Bowden, M. D. ; Uchino, K. ; Muraoka, K. ; Yoshida, M. / A study of ion velocity distribution functions in processing plasmas produced by electron cyclotron resonance discharges. In: Journal of Applied Physics. 1997 ; Vol. 82, No. 3. pp. 1036-1041.
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