A study on the physical properties of AZO films as variation of sputtering conditions

Yun Hae Kim, Seung Jun An, Joon Young Kim, Kyung Man Moon, Pangpang Wang, Dongyan Zhang, Ri Ichi Murakami

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    TCO (transparent conducting oxide) films are widely used as photoelectric devices in flat panel displays and solar cells. Until now, ITO (indium-tin oxide) films have been used as TCO films. However, with the increase in the cost of ITO films, researchers have been searching for new materials to use as TCO films. Transparent and conductive aluminum-doped zinc oxide films were prepared by DC magnetron sputtering at different substrate temperatures. The electric and optical properties of these films were studied by Hall measurement and optical spectroscopy, respectively. All of the films that were deposited at temperatures higher than 200 °C substrate temperature demonstrated over 80% transmittance in the range of the visible spectrum. Since the surface mobility of a particle is limited at a low temperature, the growth rate of AZO thin films would be higher than that at a high temperature. And the films showed minimum resistivity of 6.77 × 10-3 Ω·cm at substrate temperature of 200 °C.

    Original languageEnglish
    Title of host publicationApplications of Engineering Materials
    Pages54-57
    Number of pages4
    DOIs
    Publication statusPublished - Aug 12 2011
    Event2011 International Conference on Advanced Engineering Materials and Technology, AEMT 2011 - Sanya, China
    Duration: Jul 29 2011Jul 31 2011

    Publication series

    NameAdvanced Materials Research
    Volume287-290
    ISSN (Print)1022-6680

    Other

    Other2011 International Conference on Advanced Engineering Materials and Technology, AEMT 2011
    CountryChina
    CitySanya
    Period7/29/117/31/11

    All Science Journal Classification (ASJC) codes

    • Engineering(all)

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  • Cite this

    Kim, Y. H., An, S. J., Kim, J. Y., Moon, K. M., Wang, P., Zhang, D., & Murakami, R. I. (2011). A study on the physical properties of AZO films as variation of sputtering conditions. In Applications of Engineering Materials (pp. 54-57). (Advanced Materials Research; Vol. 287-290). https://doi.org/10.4028/www.scientific.net/AMR.287-290.54