Active mask UV lithography systme for MEMS and μTAS applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original languageEnglish
Title of host publicationProceedings of the 21st Annual ASPE Meeting, ASPE 2006
Publication statusPublished - 2006
Externally publishedYes
Event21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 - Monterey, CA, United States
Duration: Oct 15 2006 → Oct 20 2006

Other

Other21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006
CountryUnited States
CityMonterey, CA
Period10/15/06 → 10/20/06

Fingerprint

Lithography
MEMS
Masks

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Cite this

Hayashi, T., Shibata, T., Kawashima, T., Makino, E., Mineta, T., & Masuzawa, T. (2006). Active mask UV lithography systme for MEMS and μTAS applications. In Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

Active mask UV lithography systme for MEMS and μTAS applications. / Hayashi, Terutake; Shibata, Takayuki; Kawashima, Takahiro; Makino, Eiji; Mineta, Takashi; Masuzawa, Toru.

Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Hayashi, T, Shibata, T, Kawashima, T, Makino, E, Mineta, T & Masuzawa, T 2006, Active mask UV lithography systme for MEMS and μTAS applications. in Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006, Monterey, CA, United States, 10/15/06.
Hayashi T, Shibata T, Kawashima T, Makino E, Mineta T, Masuzawa T. Active mask UV lithography systme for MEMS and μTAS applications. In Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006
Hayashi, Terutake ; Shibata, Takayuki ; Kawashima, Takahiro ; Makino, Eiji ; Mineta, Takashi ; Masuzawa, Toru. / Active mask UV lithography systme for MEMS and μTAS applications. Proceedings of the 21st Annual ASPE Meeting, ASPE 2006. 2006.
@inproceedings{19a09c072d88482d98dddd992a1bac58,
title = "Active mask UV lithography systme for MEMS and μTAS applications",
author = "Terutake Hayashi and Takayuki Shibata and Takahiro Kawashima and Eiji Makino and Takashi Mineta and Toru Masuzawa",
year = "2006",
language = "English",
isbn = "1887706410",
booktitle = "Proceedings of the 21st Annual ASPE Meeting, ASPE 2006",

}

TY - GEN

T1 - Active mask UV lithography systme for MEMS and μTAS applications

AU - Hayashi, Terutake

AU - Shibata, Takayuki

AU - Kawashima, Takahiro

AU - Makino, Eiji

AU - Mineta, Takashi

AU - Masuzawa, Toru

PY - 2006

Y1 - 2006

UR - http://www.scopus.com/inward/record.url?scp=84884810802&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84884810802&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84884810802

SN - 1887706410

SN - 9781887706414

BT - Proceedings of the 21st Annual ASPE Meeting, ASPE 2006

ER -

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