@inproceedings{19a09c072d88482d98dddd992a1bac58,
title = "Active mask UV lithography systme for MEMS and μTAS applications",
author = "Terutake Hayashi and Takayuki Shibata and Takahiro Kawashima and Eiji Makino and Takashi Mineta and Toru Masuzawa",
year = "2006",
month = dec,
day = "1",
language = "English",
isbn = "1887706410",
series = "Proceedings of the 21st Annual ASPE Meeting, ASPE 2006",
booktitle = "Proceedings of the 21st Annual ASPE Meeting, ASPE 2006",
note = "21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 ; Conference date: 15-10-2006 Through 20-10-2006",
}