Active mask UV lithography systme for MEMS and μTAS applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationProceedings of the 21st Annual ASPE Meeting, ASPE 2006
Publication statusPublished - Dec 1 2006
Externally publishedYes
Event21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 - Monterey, CA, United States
Duration: Oct 15 2006Oct 20 2006

Publication series

NameProceedings of the 21st Annual ASPE Meeting, ASPE 2006

Other

Other21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006
CountryUnited States
CityMonterey, CA
Period10/15/0610/20/06

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Cite this

Hayashi, T., Shibata, T., Kawashima, T., Makino, E., Mineta, T., & Masuzawa, T. (2006). Active mask UV lithography systme for MEMS and μTAS applications. In Proceedings of the 21st Annual ASPE Meeting, ASPE 2006 (Proceedings of the 21st Annual ASPE Meeting, ASPE 2006).