Active mask UV lithography systme for MEMS and μTAS applications

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationProceedings of the 21st Annual ASPE Meeting, ASPE 2006
Publication statusPublished - Dec 1 2006
Externally publishedYes
Event21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006 - Monterey, CA, United States
Duration: Oct 15 2006Oct 20 2006

Publication series

NameProceedings of the 21st Annual ASPE Meeting, ASPE 2006

Other

Other21st Annual Meeting of the American Society for Precision Engineering, ASPE 2006
Country/TerritoryUnited States
CityMonterey, CA
Period10/15/0610/20/06

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

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