Advanced oxidation processes (AOPs) assisted by excimer lamp

Tomokazu Ikematsu; Nobuya Hayashi; Satoshi Ihara; Saburoh Satoh; Chobei Yamabe

doi:10.1016/j.vacuum.2003.12.090

Advanced oxidation processes (AOPs) assisted by excimer lamp

Tomokazu Ikematsu, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Chobei Yamabe

Research output: Contribution to journal › Conference article › peer-review

9 Citations (Scopus)

Abstract

The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.

Original language	English
Pages (from-to)	579-582
Number of pages	4
Journal	Vacuum
Volume	73
Issue number	3-4
DOIs	https://doi.org/10.1016/j.vacuum.2003.12.090
Publication status	Published - Apr 19 2004
Externally published	Yes
Event	The 4th International Symposium on Applied Plasma Science - Kyoto, Japan Duration: Sept 1 2003 → Sept 5 2003

All Science Journal Classification (ASJC) codes

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/j.vacuum.2003.12.090

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title = "Advanced oxidation processes (AOPs) assisted by excimer lamp",

abstract = "The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.",

author = "Tomokazu Ikematsu and Nobuya Hayashi and Satoshi Ihara and Saburoh Satoh and Chobei Yamabe",

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note = "The 4th International Symposium on Applied Plasma Science ; Conference date: 01-09-2003 Through 05-09-2003",

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TY - JOUR

T1 - Advanced oxidation processes (AOPs) assisted by excimer lamp

AU - Ikematsu, Tomokazu

AU - Hayashi, Nobuya

AU - Ihara, Satoshi

AU - Satoh, Saburoh

AU - Yamabe, Chobei

PY - 2004/4/19

Y1 - 2004/4/19

N2 - The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.

AB - The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.

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DO - 10.1016/j.vacuum.2003.12.090

M3 - Conference article

AN - SCOPUS:1842425380

SN - 0042-207X

VL - 73

SP - 579

EP - 582

JO - Vacuum

JF - Vacuum

IS - 3-4

T2 - The 4th International Symposium on Applied Plasma Science

Y2 - 1 September 2003 through 5 September 2003

ER -

Advanced oxidation processes (AOPs) assisted by excimer lamp

Abstract

All Science Journal Classification (ASJC) codes

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