Advanced oxidation processes (AOPs) assisted by excimer lamp

Tomokazu Ikematsu, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Chobei Yamabe

Research output: Contribution to journalConference article

8 Citations (Scopus)

Abstract

The several types of advanced oxidation processes (AOPs) utilizing UV light, ozone and hydrogen peroxide have been studied to remove both organic and inorganic compounds from water and air. One of the AOPs, UV-ozonation process utilizing the excimer lamp was developed for water purification. The UV light emitted from KrCl excimer with the wavelength of 222nm that destructs the hydrogen peroxide to hydroxyl radical realizes the AOPs. The ability of the AOPs with the excimer lamp was confirmed by the treatment of the humic acid solution.

Original languageEnglish
Pages (from-to)579-582
Number of pages4
JournalVacuum
Volume73
Issue number3-4
DOIs
Publication statusPublished - Apr 19 2004
Externally publishedYes
EventThe 4th International Symposium on Applied Plasma Science - Kyoto, Japan
Duration: Sep 1 2003Sep 5 2003

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All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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