An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

Viet Ha Tran, Takeshi Yatabe, Takahiro Matsumoto, Hidetaka Nakai, Kazuharu Suzuki, Takao Enomoto, Takashi Hibino, Kenji Kaneko, Seiji Ogo

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an IrV complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.

Original languageEnglish
Pages (from-to)12589-12592
Number of pages4
JournalChemical Communications
Volume51
Issue number63
DOIs
Publication statusPublished - Aug 14 2015

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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