An IrSi oxide film as a highly active water-oxidation catalyst in acidic media

Viet Ha Tran, Takeshi Yatabe, Takahiro Matsumoto, Hidetaka Nakai, Kazuharu Suzuki, Takao Enomoto, Takashi Hibino, Kenji Kaneko, Seiji Ogo

    Research output: Contribution to journalArticlepeer-review

    14 Citations (Scopus)

    Abstract

    We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an IrV complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.

    Original languageEnglish
    Pages (from-to)12589-12592
    Number of pages4
    JournalChemical Communications
    Volume51
    Issue number63
    DOIs
    Publication statusPublished - Aug 14 2015

    All Science Journal Classification (ASJC) codes

    • Catalysis
    • Electronic, Optical and Magnetic Materials
    • Ceramics and Composites
    • Chemistry(all)
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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