Analysis of cluster growth in magnetron-sputtering metal-cluster source by optical emission spectroscopy

Research output: Contribution to journalArticle

Abstract

We investigate cluster-growth processes in a magnetronsputtering cluster source by employing silver as a target metal. An optical emission spectrum of discharge plasma is measured along with a mass spectrum of silver cluster cations as a function of discharge power. The former quantifies the number of silver atoms sputtered, while the latter provides a size distribution of clusters produced. A scenario of cluster growth is discussed based on a simple statistical model.

Original languageEnglish
Pages (from-to)1537-1540
Number of pages4
JournalChemistry Letters
Volume48
Issue number12
DOIs
Publication statusPublished - Jan 1 2019

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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