TY - GEN
T1 - Application of nano-imprint technology to grating scale for a rotary microencoder
AU - Takeshita, Toshihiro
AU - Iwasaki, Takuma
AU - Higurashi, Eiji
AU - Miyazaki, Tatsuya
AU - Sawada, Renshi
PY - 2013/12/1
Y1 - 2013/12/1
N2 - Using nano-imprint technology we have developed a rotary diffraction grating scale, which is used for micro rotary encoding. The off-center error between the center of the trough-hole for a rotational axis and the center of the high-precision micro-pattern on the periphery of the scale is less than 3 μm because we are able to shape the through-hole and the grating pattern simultaneously. The use of nano-imprinting is epoch-making, in view of the traditionally poor centering precision of grating scale through-holes fabricated using the conventional photolithography coupled with machining of the through-hole.
AB - Using nano-imprint technology we have developed a rotary diffraction grating scale, which is used for micro rotary encoding. The off-center error between the center of the trough-hole for a rotational axis and the center of the high-precision micro-pattern on the periphery of the scale is less than 3 μm because we are able to shape the through-hole and the grating pattern simultaneously. The use of nano-imprinting is epoch-making, in view of the traditionally poor centering precision of grating scale through-holes fabricated using the conventional photolithography coupled with machining of the through-hole.
UR - http://www.scopus.com/inward/record.url?scp=84892143462&partnerID=8YFLogxK
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U2 - 10.1109/OMN.2013.6659087
DO - 10.1109/OMN.2013.6659087
M3 - Conference contribution
AN - SCOPUS:84892143462
SN - 9781479915125
T3 - International Conference on Optical MEMS and Nanophotonics
SP - 117
EP - 118
BT - Optical MEMS and Nanophotonics 2013, OMN 2013 - Proceedings
T2 - 2013 International Conference on Optical MEMS and Nanophotonics, OMN 2013
Y2 - 18 August 2013 through 22 August 2013
ER -