Athermal and high-Q hybrid TiO2-Si3N4 ring resonator via an etching-free fabrication technique

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

In this work, we have demonstrated a hybrid TiO2-Si3N4 ring resonator with a high-Q and a temperature-insensitive resonance. The waveguide consists of a thermo-optic positive Si3N4 slab and a negative TiO2 overcladding. The TiO2 layer has a shallow ridge structure, which has been designed to realize an athermal operation and maintain a low scattering loss. During the fabrication of this waveguide, there was no need to utilize the dry-etching process. The method affords a straightforward fabrication and a precise control over the waveguide dimensions. As a result, the ring resonator exhibits a high Q value of 1.55 × 105, a low propagation loss of 0.4 dB/cm, and a small temperature-dependent wavelength shift of 0.14 pm/°C between 25 and 60 °C.

Original languageEnglish
Pages (from-to)405-409
Number of pages5
JournalACS Photonics
Volume2
Issue number3
DOIs
Publication statusPublished - Mar 18 2015

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Q factors
Resonators
Etching
Waveguides
resonators
etching
waveguides
Fabrication
fabrication
Temperature
rings
Dry etching
ridges
Optics
slabs
optics
Scattering
Wavelength
temperature
propagation

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biotechnology
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Athermal and high-Q hybrid TiO2-Si3N4 ring resonator via an etching-free fabrication technique. / Qiu, Feng; Spring, Andrew Mark; Yokoyama, Shiyoshi.

In: ACS Photonics, Vol. 2, No. 3, 18.03.2015, p. 405-409.

Research output: Contribution to journalArticle

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