TY - JOUR
T1 - Atomic and molecular processes in plasma decomposition method of hydrocarbon gas
AU - Oya, Makoto
AU - Ikeda, Ryosuke
AU - Katayama, Kazunari
N1 - Funding Information:
The author thanks Dr. K. Ohya for his encouragement with simulation code development and discussion. This work was supported by the Grant-in-Aid for Scientific Research of MEXT KAKENHI (17H06934, 18K13527).
Publisher Copyright:
© 2020 The Japan Society of Plasma Science and Nuclear Fusion Research.
PY - 2020
Y1 - 2020
N2 - In order to understand the decomposition process of hydrocarbons in a hydrogen (H) plasma, a Monte Carlo simulation of collisional transport of a methane (CH4) molecule was developed. The model simulates collision reactions with plasma ions and electrons (including dissociation, excitation, ionization, and charge exchange) and elastic collisions with residual H2 gas. The interaction with a surrounding wall was also considered (reflection from the wall, deposition on the wall, and reemission of carbon (C) and hydrocarbons (CHx) by physical and chemical sputtering). In a low-temperature plasma, because the decomposition process was mainly dominated by charge exchange with plasma ions followed by dissociative recombination with electrons, many neutral C and CHx species were obtained. At high temperature, the ionized Cy+ and CH+x species were the dominant ones because of the dissociative ionization and excitation by electrons. Comparable to our previous experiment, the calculated decomposition rate of CH4 into neutral and ionized C atoms was ~50% for a temperature of 15 eV and a density of 3.5 x 1017 m-3. Nevertheless, the calculated distribution of C and CHx deposits on the vessel wall were localized in the upstream of the plasma, which was different from the experimental setup.
AB - In order to understand the decomposition process of hydrocarbons in a hydrogen (H) plasma, a Monte Carlo simulation of collisional transport of a methane (CH4) molecule was developed. The model simulates collision reactions with plasma ions and electrons (including dissociation, excitation, ionization, and charge exchange) and elastic collisions with residual H2 gas. The interaction with a surrounding wall was also considered (reflection from the wall, deposition on the wall, and reemission of carbon (C) and hydrocarbons (CHx) by physical and chemical sputtering). In a low-temperature plasma, because the decomposition process was mainly dominated by charge exchange with plasma ions followed by dissociative recombination with electrons, many neutral C and CHx species were obtained. At high temperature, the ionized Cy+ and CH+x species were the dominant ones because of the dissociative ionization and excitation by electrons. Comparable to our previous experiment, the calculated decomposition rate of CH4 into neutral and ionized C atoms was ~50% for a temperature of 15 eV and a density of 3.5 x 1017 m-3. Nevertheless, the calculated distribution of C and CHx deposits on the vessel wall were localized in the upstream of the plasma, which was different from the experimental setup.
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U2 - 10.1585/pfr.15.2405032
DO - 10.1585/pfr.15.2405032
M3 - Article
AN - SCOPUS:85089355440
SN - 1880-6821
VL - 15
JO - Plasma and Fusion Research
JF - Plasma and Fusion Research
IS - SpecialIssue1
M1 - 2405032
ER -