Abstract
After an evaluation of Zr precursor, quaternary Pb(Zr,Ti)Ox [PZT] films were prepared by a combination of binary atomic layer deposition (ALD) processes. ZrOx films were deposited on Pt/TiO x/SiOx/Si substrates using liquid injection ALD. Zr(C 11H19O2)4 [Zr(DPM)4] dissolved in ethylcyclohexane (ECH) with a concentration of 0.1 M and water were used as precursor and oxidant, respectively. According to the Arrhenius plot for the deposition rate of ZrOx films at various deposition temperatures, the Zr precursor appeared to start marked thermal decomposition at a deposition temperature of 360°C. Below this thermal decomposition temperature, a saturated deposition rate of ZrOx films against input of Zr precursor was confirmed. The saturated deposition rate was about 5-6×10-12 mol/cm2·cycle at a deposition temperature of 300°C. Subsequently, binary ALD processes of TiOx and PbO films, whose self-regulated growth mode has been already confirmed, were combined with the ZrOx process into multi-precursor ALD of PZT films. Ti(OC3H7)2(C11H 19O2)2 [Ti(Oi-Pr)2(DPM)2] and Pb(C11H19O2)2 [Pb(DPM) 2] dissolved in ECH with a concentration of 0.1 M were used for PZT film preparation as well as Zr(DPM)4. Unit sequences described as 1×(Pb-O) - 2×(Ti-O) - n×(Zr-O) were repeated to deposit PZT films at 240°C. In the PZT process, the deposition rates of all cations were higher than those in their binary processes. The Pb/(Zr+Ti) and Zr/(Zr+Ti) ratio was adjusted by repeating the number of Zr-O cycles in a sequence. As-deposited PZT films were amorphous. Crystalline PZT films were obtained after annealing at 650°C, and the PZT crystal showed a preferred (100)/(001) orientation.
| Original language | English |
|---|---|
| Title of host publication | 2006 15th IEEE International Symposium on Applications of Ferroelectrics, ISAF |
| DOIs | |
| Publication status | Published - Dec 1 2006 |
| Externally published | Yes |
| Event | 2006 15th IEEE International Symposium on Applications of Ferroelectrics, ISAF - Sunset Beach, NC, United States Duration: Jul 30 2006 → Aug 3 2006 |
Publication series
| Name | IEEE International Symposium on Applications of Ferroelectrics |
|---|
Other
| Other | 2006 15th IEEE International Symposium on Applications of Ferroelectrics, ISAF |
|---|---|
| Country | United States |
| City | Sunset Beach, NC |
| Period | 7/30/06 → 8/3/06 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
Cite this
Atomic layer deposition of Pb(Zr,Ti)Ox thin films by a combination of binary atomic layer deposition processes. / Watanabe, Takayuki; Hoffmann-Eifert, Susanne; Waser, Rainer; Hwang, Cheol Seong.
2006 15th IEEE International Symposium on Applications of Ferroelectrics, ISAF. 2006. 4349293 (IEEE International Symposium on Applications of Ferroelectrics).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Atomic layer deposition of Pb(Zr,Ti)Ox thin films by a combination of binary atomic layer deposition processes
AU - Watanabe, Takayuki
AU - Hoffmann-Eifert, Susanne
AU - Waser, Rainer
AU - Hwang, Cheol Seong
PY - 2006/12/1
Y1 - 2006/12/1
N2 - After an evaluation of Zr precursor, quaternary Pb(Zr,Ti)Ox [PZT] films were prepared by a combination of binary atomic layer deposition (ALD) processes. ZrOx films were deposited on Pt/TiO x/SiOx/Si substrates using liquid injection ALD. Zr(C 11H19O2)4 [Zr(DPM)4] dissolved in ethylcyclohexane (ECH) with a concentration of 0.1 M and water were used as precursor and oxidant, respectively. According to the Arrhenius plot for the deposition rate of ZrOx films at various deposition temperatures, the Zr precursor appeared to start marked thermal decomposition at a deposition temperature of 360°C. Below this thermal decomposition temperature, a saturated deposition rate of ZrOx films against input of Zr precursor was confirmed. The saturated deposition rate was about 5-6×10-12 mol/cm2·cycle at a deposition temperature of 300°C. Subsequently, binary ALD processes of TiOx and PbO films, whose self-regulated growth mode has been already confirmed, were combined with the ZrOx process into multi-precursor ALD of PZT films. Ti(OC3H7)2(C11H 19O2)2 [Ti(Oi-Pr)2(DPM)2] and Pb(C11H19O2)2 [Pb(DPM) 2] dissolved in ECH with a concentration of 0.1 M were used for PZT film preparation as well as Zr(DPM)4. Unit sequences described as 1×(Pb-O) - 2×(Ti-O) - n×(Zr-O) were repeated to deposit PZT films at 240°C. In the PZT process, the deposition rates of all cations were higher than those in their binary processes. The Pb/(Zr+Ti) and Zr/(Zr+Ti) ratio was adjusted by repeating the number of Zr-O cycles in a sequence. As-deposited PZT films were amorphous. Crystalline PZT films were obtained after annealing at 650°C, and the PZT crystal showed a preferred (100)/(001) orientation.
AB - After an evaluation of Zr precursor, quaternary Pb(Zr,Ti)Ox [PZT] films were prepared by a combination of binary atomic layer deposition (ALD) processes. ZrOx films were deposited on Pt/TiO x/SiOx/Si substrates using liquid injection ALD. Zr(C 11H19O2)4 [Zr(DPM)4] dissolved in ethylcyclohexane (ECH) with a concentration of 0.1 M and water were used as precursor and oxidant, respectively. According to the Arrhenius plot for the deposition rate of ZrOx films at various deposition temperatures, the Zr precursor appeared to start marked thermal decomposition at a deposition temperature of 360°C. Below this thermal decomposition temperature, a saturated deposition rate of ZrOx films against input of Zr precursor was confirmed. The saturated deposition rate was about 5-6×10-12 mol/cm2·cycle at a deposition temperature of 300°C. Subsequently, binary ALD processes of TiOx and PbO films, whose self-regulated growth mode has been already confirmed, were combined with the ZrOx process into multi-precursor ALD of PZT films. Ti(OC3H7)2(C11H 19O2)2 [Ti(Oi-Pr)2(DPM)2] and Pb(C11H19O2)2 [Pb(DPM) 2] dissolved in ECH with a concentration of 0.1 M were used for PZT film preparation as well as Zr(DPM)4. Unit sequences described as 1×(Pb-O) - 2×(Ti-O) - n×(Zr-O) were repeated to deposit PZT films at 240°C. In the PZT process, the deposition rates of all cations were higher than those in their binary processes. The Pb/(Zr+Ti) and Zr/(Zr+Ti) ratio was adjusted by repeating the number of Zr-O cycles in a sequence. As-deposited PZT films were amorphous. Crystalline PZT films were obtained after annealing at 650°C, and the PZT crystal showed a preferred (100)/(001) orientation.
UR - http://www.scopus.com/inward/record.url?scp=50249110803&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=50249110803&partnerID=8YFLogxK
U2 - 10.1109/ISAF.2006.4349293
DO - 10.1109/ISAF.2006.4349293
M3 - Conference contribution
AN - SCOPUS:50249110803
SN - 142441332X
SN - 9781424413324
T3 - IEEE International Symposium on Applications of Ferroelectrics
BT - 2006 15th IEEE International Symposium on Applications of Ferroelectrics, ISAF
ER -