Atomic structure of AlN/Al2O3 interfaces fabricated by pulsed-laser deposition

Y. Tokumoto, Y. Sato, T. Yamamoto, N. Shibata, Y. Ikuhara

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The atomic structure of AlN/Al2O3 interface fabricated by pulsed laser deposition is characterized by high-resolution transmission electron microscopy (HRTEM) combined with systematic multi-slice HRTEM image simulations. It is found that the AlN film deposited on a (0001) Al2O3 substrate grows epitaxially with the orientation relationship of (0001)AlN//(0001) Al2O3 and [1100 ]AlN//[11 20 ]Al2O3, with an atomically sharp interface. The observed interface showed best correspondence with the rigid structural model that AlN is terminated by Al at the interface, while the Al 2O3 substrate is terminated by O. Detailed structural analysis indicates that Al sites at the interface are coordinated by both oxygen and nitrogen in this model, with similar coordination environment in AlN. This favored coordination state at the interface may stabilize the AlN/Al 2O3 interface.

Original languageEnglish
Pages (from-to)2553-2557
Number of pages5
JournalJournal of Materials Science
Issue number9
Publication statusPublished - May 1 2006
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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