Au-induced lateral crystallization of a-Si1-xGex (x: 0-1) at low temperature

Tomohisa Aoki, Hiroshi Kanno, Atsushi Kenjo, Taizoh Sadoh, Masanobu Miyao

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Abstract

Au-induced lateral crystallization of amorphous Si1-xGex (x: 0-1) on SiO2 at a low temperature (400 °C) has been investigated. Although the growth velocity decreased with increasing Ge fraction, growth velocity exceeding 20 μm/h was obtained for all Ge fractions. As a result, poly-Si1-xGex with large areas (> 20 μm) was obtained at a low temperature (400 °C). This is a great advantage of Au-induced lateral crystallization compared with Ni. However, the concentrations in the surface regions (depth: 0-20 nm) of the lateral growth regions were high (10-30%), though those in the deeper regions (depth: 20-50 nm) were as small as 1-2%. Removing of the surface regions with the high Au concentrations and gettering of Au atoms in the deeper regions are necessary to apply the grown layers to the device fabrication.

Original languageEnglish
Pages (from-to)44-47
Number of pages4
JournalThin Solid Films
Volume508
Issue number1-2
DOIs
Publication statusPublished - Jun 5 2006

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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