Autostoichiometric vapor deposition III. A study of stoichiometry and characterization of epitaxial LiTaO3 layer

K. W. Chour, R. C. Zhang, M. S. Goorsky, T. Takada, E. Akiba, T. Kumagai, K. Kawaguchi, M. L. Jensen, C. Eaves, R. Xu

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