Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

Kuan Chen Chen, Chia Fu Chen, Cheng Yang Lien, Kuo Feng Chiu, Jen Bin Shi, Yu Jer Tsai, Ting Kuei Lien, Kohei Ogiwara, Kiichiro Uchino, Yoshinobu Kawai

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Abstract

A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.

Original languageEnglish
Article number01AH01
JournalJapanese Journal of Applied Physics
Volume55
Issue number1
DOIs
Publication statusPublished - Jan 2016

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All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Chen, K. C., Chen, C. F., Lien, C. Y., Chiu, K. F., Shi, J. B., Tsai, Y. J., ... Kawai, Y. (2016). Axial distribution of a VHF H2 plasma produced by a narrow gap discharge. Japanese Journal of Applied Physics, 55(1), [01AH01]. https://doi.org/10.7567/JJAP.55.01AH01