Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

Kuan Chen Chen; Chia Fu Chen; Cheng Yang Lien; Kuo Feng Chiu; Jen Bin Shi; Yu Jer Tsai; Ting Kuei Lien; Kohei Ogiwara; Kiichiro Uchino; Yoshinobu Kawai

doi:10.7567/JJAP.55.01AH01

Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

Kuan Chen Chen, Chia Fu Chen, Cheng Yang Lien, Kuo Feng Chiu, Jen Bin Shi, Yu Jer Tsai, Ting Kuei Lien, Kohei Ogiwara, Kiichiro Uchino, Yoshinobu Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm². Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.

Original language	English
Article number	01AH01
Journal	Japanese journal of applied physics
Volume	55
Issue number	1
DOIs	https://doi.org/10.7567/JJAP.55.01AH01
Publication status	Published - Jan 2016

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.7567/JJAP.55.01AH01

Cite this

@article{cab602f1cb5d4ba5ba7c42925967756e,

title = "Axial distribution of a VHF H2 plasma produced by a narrow gap discharge",

abstract = "A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.",

author = "Chen, {Kuan Chen} and Chen, {Chia Fu} and Lien, {Cheng Yang} and Chiu, {Kuo Feng} and Shi, {Jen Bin} and Tsai, {Yu Jer} and Lien, {Ting Kuei} and Kohei Ogiwara and Kiichiro Uchino and Yoshinobu Kawai",

year = "2016",

month = jan,

doi = "10.7567/JJAP.55.01AH01",

language = "English",

volume = "55",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

AU - Chen, Kuan Chen

AU - Chen, Chia Fu

AU - Lien, Cheng Yang

AU - Chiu, Kuo Feng

AU - Shi, Jen Bin

AU - Tsai, Yu Jer

AU - Lien, Ting Kuei

AU - Ogiwara, Kohei

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

PY - 2016/1

Y1 - 2016/1

N2 - A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.

AB - A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.

UR - http://www.scopus.com/inward/record.url?scp=84953310740&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84953310740&partnerID=8YFLogxK

U2 - 10.7567/JJAP.55.01AH01

DO - 10.7567/JJAP.55.01AH01

M3 - Article

AN - SCOPUS:84953310740

SN - 0021-4922

VL - 55

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 1

M1 - 01AH01

ER -

Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this