Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container

Kei Kitamura; Toshiro Doi; Syuhei Kurokawa; Yoji Umezaki; Yoji Matsukawa; Yota Ooki; Tadashi Hasegawa; Isamu Koshiyama; Koichiro Ichikawa; Yoshio Nakamura

doi:10.4028/www.scientific.net/KEM.447-448.61

Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container

Kei Kitamura, Toshiro Doi, Syuhei Kurokawa, Yoji Umezaki, Yoji Matsukawa, Yota Ooki, Tadashi Hasegawa, Isamu Koshiyama, Koichiro Ichikawa, Yoshio Nakamura

Manufacturing Process

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Citations (Scopus)

Abstract

We designed and manufactured a prototype of a unique CMP machine, which can perform double-side CMP simultaneously in a sealed and pressure container as regarding effective action of the processing atmosphere around workpieces as important. Polishing experiments with single crystal silicon (Si) wafers (100) are performed by charging the container with various gases. As a result, the removal rates increased by up to 25% under high pressure oxygen gas atmosphere.

Original language	English
Title of host publication	Advances in Precision Engineering
Pages	61-65
Number of pages	5
DOIs	https://doi.org/10.4028/www.scientific.net/KEM.447-448.61
Publication status	Published - Dec 29 2010
Event	ICoPE2010 and 13th ICPE International Conference on Precision Engineering - , Singapore Duration: Jul 28 2010 → Jul 30 2010

Publication series

Name	Key Engineering Materials
Volume	447 448
ISSN (Print)	1013-9826

Other

Other	ICoPE2010 and 13th ICPE International Conference on Precision Engineering
Country	Singapore
Period	7/28/10 → 7/30/10

All Science Journal Classification (ASJC) codes

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/www.scientific.net/KEM.447-448.61

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Cite this

Kitamura, K., Doi, T., Kurokawa, S., Umezaki, Y., Matsukawa, Y., Ooki, Y., Hasegawa, T., Koshiyama, I., Ichikawa, K., & Nakamura, Y. (2010). Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container. In Advances in Precision Engineering (pp. 61-65). (Key Engineering Materials; Vol. 447 448). https://doi.org/10.4028/www.scientific.net/KEM.447-448.61

Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container. / Kitamura, Kei; Doi, Toshiro; Kurokawa, Syuhei; Umezaki, Yoji; Matsukawa, Yoji; Ooki, Yota; Hasegawa, Tadashi; Koshiyama, Isamu; Ichikawa, Koichiro; Nakamura, Yoshio.

Advances in Precision Engineering. 2010. p. 61-65 (Key Engineering Materials; Vol. 447 448).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kitamura, K, Doi, T, Kurokawa, S, Umezaki, Y, Matsukawa, Y, Ooki, Y, Hasegawa, T, Koshiyama, I, Ichikawa, K & Nakamura, Y 2010, Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container. in Advances in Precision Engineering. Key Engineering Materials, vol. 447 448, pp. 61-65, ICoPE2010 and 13th ICPE International Conference on Precision Engineering, Singapore, 7/28/10. https://doi.org/10.4028/www.scientific.net/KEM.447-448.61

Kitamura, Kei ; Doi, Toshiro ; Kurokawa, Syuhei ; Umezaki, Yoji ; Matsukawa, Yoji ; Ooki, Yota ; Hasegawa, Tadashi ; Koshiyama, Isamu ; Ichikawa, Koichiro ; Nakamura, Yoshio. / Basic characteristics of a simultaneous double-side CMP machine, housed in a sealed, pressure-resistance container. Advances in Precision Engineering. 2010. pp. 61-65 (Key Engineering Materials).

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