Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film

Xiaoyang Cheng, Shiyoshi Yokoyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution


High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.

Original languageEnglish
Title of host publication22nd Microoptics Conference, MOC 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages2
ISBN (Electronic)9784863486096
Publication statusPublished - Nov 19 2017
Event22nd Microoptics Conference, MOC 2017 - Tokyo, Japan
Duration: Nov 19 2017Nov 22 2017

Publication series

Name22nd Microoptics Conference, MOC 2017


Other22nd Microoptics Conference, MOC 2017

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

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