Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film

Xiaoyang Cheng, Shiyoshi Yokoyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.

Original languageEnglish
Title of host publication22nd Microoptics Conference, MOC 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages96-97
Number of pages2
ISBN (Electronic)9784863486096
DOIs
Publication statusPublished - Nov 19 2017
Event22nd Microoptics Conference, MOC 2017 - Tokyo, Japan
Duration: Nov 19 2017Nov 22 2017

Publication series

Name22nd Microoptics Conference, MOC 2017
Volume2017-November

Other

Other22nd Microoptics Conference, MOC 2017
CountryJapan
CityTokyo
Period11/19/1711/22/17

Fingerprint

Optical losses
Bragg gratings
viability
Photonics
Q factors
Resonators
platforms
resonators
photonics
rings
silicon nitride

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Cite this

Cheng, X., & Yokoyama, S. (2017). Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film. In 22nd Microoptics Conference, MOC 2017 (pp. 96-97). (22nd Microoptics Conference, MOC 2017; Vol. 2017-November). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.23919/MOC.2017.8244509

Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film. / Cheng, Xiaoyang; Yokoyama, Shiyoshi.

22nd Microoptics Conference, MOC 2017. Institute of Electrical and Electronics Engineers Inc., 2017. p. 96-97 (22nd Microoptics Conference, MOC 2017; Vol. 2017-November).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cheng, X & Yokoyama, S 2017, Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film. in 22nd Microoptics Conference, MOC 2017. 22nd Microoptics Conference, MOC 2017, vol. 2017-November, Institute of Electrical and Electronics Engineers Inc., pp. 96-97, 22nd Microoptics Conference, MOC 2017, Tokyo, Japan, 11/19/17. https://doi.org/10.23919/MOC.2017.8244509
Cheng X, Yokoyama S. Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film. In 22nd Microoptics Conference, MOC 2017. Institute of Electrical and Electronics Engineers Inc. 2017. p. 96-97. (22nd Microoptics Conference, MOC 2017). https://doi.org/10.23919/MOC.2017.8244509
Cheng, Xiaoyang ; Yokoyama, Shiyoshi. / Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film. 22nd Microoptics Conference, MOC 2017. Institute of Electrical and Electronics Engineers Inc., 2017. pp. 96-97 (22nd Microoptics Conference, MOC 2017).
@inproceedings{c7740049176d4b2795e7964dba9a7a3c,
title = "Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film",
abstract = "High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.",
author = "Xiaoyang Cheng and Shiyoshi Yokoyama",
year = "2017",
month = "11",
day = "19",
doi = "10.23919/MOC.2017.8244509",
language = "English",
series = "22nd Microoptics Conference, MOC 2017",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "96--97",
booktitle = "22nd Microoptics Conference, MOC 2017",
address = "United States",

}

TY - GEN

T1 - Bragg grating coupled high Q factor ring resonator using LSCVD deposited Si3N4 film

AU - Cheng, Xiaoyang

AU - Yokoyama, Shiyoshi

PY - 2017/11/19

Y1 - 2017/11/19

N2 - High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.

AB - High-quality Si3N4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si3N4 with Q-factor of 5.2×104 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si3N4 exemplify its viability as a photonic integration platform.

UR - http://www.scopus.com/inward/record.url?scp=85045831095&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85045831095&partnerID=8YFLogxK

U2 - 10.23919/MOC.2017.8244509

DO - 10.23919/MOC.2017.8244509

M3 - Conference contribution

AN - SCOPUS:85045831095

T3 - 22nd Microoptics Conference, MOC 2017

SP - 96

EP - 97

BT - 22nd Microoptics Conference, MOC 2017

PB - Institute of Electrical and Electronics Engineers Inc.

ER -