Cell library development methodology for throughput enhancement of character projection equipment

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki Murakami, Katsuya Okumura

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.

Original languageEnglish
Pages (from-to)377-383
Number of pages7
JournalIEICE Transactions on Electronics
VolumeE89-C
Issue number3
DOIs
Publication statusPublished - 2006

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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    Sugihara, M., Takata, T., Nakamura, K., Inanami, R., Hayashi, H., Kishimoto, K., Hasebe, T., Kawano, Y., Matsunaga, Y., Murakami, K., & Okumura, K. (2006). Cell library development methodology for throughput enhancement of character projection equipment. IEICE Transactions on Electronics, E89-C(3), 377-383. https://doi.org/10.1093/ietele/e89-c.3.377