Cell library development methodology for throughput enhancement of electron beam direct-write lithography systems

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki Murakami, Katsuya Okumura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Citations (Scopus)

Abstract

We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (Integer Linear Programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed to increase the number of cells on a CP aperture mask Finally, a case study is shown in which the numbers of EB shots are examined under several cases.

Original languageEnglish
Title of host publication2005 International Symposium on System-on-Chip, Proceedings
PublisherIEEE Computer Society
Pages137-140
Number of pages4
ISBN (Print)0780392949, 9780780392946
DOIs
Publication statusPublished - 2005
Event2005 International Symposium on System-on-Chip - Tampere, Finland
Duration: Nov 15 2005Nov 17 2005

Publication series

Name2005 International Symposium on System-on-Chip, Proceedings
Volume2005

Other

Other2005 International Symposium on System-on-Chip
CountryFinland
CityTampere
Period11/15/0511/17/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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