Challenges in realizing ultraflat materials surfaces

Takashi Yatsui, Wataru Nomura, Fabrice Stehlin, Olivier Soppera, Makoto Naruse, Motoichi Ohtsu

Research output: Contribution to journalReview article

14 Citations (Scopus)

Abstract

Ultraflat surface substrates are required to achieve an optimal performance of future optical, electronic, or optoelectronic devices for various applications, because such surfaces reduce the scattering loss of photons, electrons, or both at the surfaces and interfaces. In this paper, we review recent progress toward the realization of ultraflat materials surfaces. First, we review the development of surface-flattening techniques. Second, we briefly review the dressed photon-phonon (DPP), a nanometric quasiparticle that describes the coupled state of a photon, an electron, and a multimode-coherent phonon. Then, we review several recent developments based on DPP-photochemical etching and desorption processes, which have resulted in angstrom-scale flat surfaces. To confirm that the superior flatness of these surfaces that originated from the DPP process, we also review a simplified mathematical model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies.

Original languageEnglish
Pages (from-to)875-885
Number of pages11
JournalBeilstein Journal of Nanotechnology
Volume4
Issue number1
DOIs
Publication statusPublished - Dec 1 2013

Fingerprint

Photons
photons
flattening
flatness
optoelectronic devices
Electrons
flat surfaces
mathematical models
near fields
Optoelectronic devices
electrons
desorption
Etching
etching
Desorption
Scattering
Mathematical models
scattering
electronics
Substrates

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)
  • Electrical and Electronic Engineering

Cite this

Yatsui, T., Nomura, W., Stehlin, F., Soppera, O., Naruse, M., & Ohtsu, M. (2013). Challenges in realizing ultraflat materials surfaces. Beilstein Journal of Nanotechnology, 4(1), 875-885. https://doi.org/10.3762/bjnano.4.99

Challenges in realizing ultraflat materials surfaces. / Yatsui, Takashi; Nomura, Wataru; Stehlin, Fabrice; Soppera, Olivier; Naruse, Makoto; Ohtsu, Motoichi.

In: Beilstein Journal of Nanotechnology, Vol. 4, No. 1, 01.12.2013, p. 875-885.

Research output: Contribution to journalReview article

Yatsui, T, Nomura, W, Stehlin, F, Soppera, O, Naruse, M & Ohtsu, M 2013, 'Challenges in realizing ultraflat materials surfaces', Beilstein Journal of Nanotechnology, vol. 4, no. 1, pp. 875-885. https://doi.org/10.3762/bjnano.4.99
Yatsui T, Nomura W, Stehlin F, Soppera O, Naruse M, Ohtsu M. Challenges in realizing ultraflat materials surfaces. Beilstein Journal of Nanotechnology. 2013 Dec 1;4(1):875-885. https://doi.org/10.3762/bjnano.4.99
Yatsui, Takashi ; Nomura, Wataru ; Stehlin, Fabrice ; Soppera, Olivier ; Naruse, Makoto ; Ohtsu, Motoichi. / Challenges in realizing ultraflat materials surfaces. In: Beilstein Journal of Nanotechnology. 2013 ; Vol. 4, No. 1. pp. 875-885.
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