Change in velocity in silicon melt of the czochralski (CZ) process in a vertical magnetic field

Kyung Woo Yi, Masahito Watanabe, Minoru Eguchi, Koichi Kakimoto, Taketoshi Hibiya

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The influence of a magnetic field on the velociry of molten silicon has been characterized both theoretically and experimentally. The velocity decrease observed by X-ray radiography in the magnetic field is in good agreement with the results obtained by numerical modelling. It is found that the rate of decrease in velocity in a vertical magnetic field is well presented using the magnetic number rather than the Hartmann number. Accordingly, the analytical expression using the square of the magnetic number, M, well describes the velociry changes as ν/ν0 = (l+M2/4)½–M/2, for experimental as well as numerically calculated data.

Original languageEnglish
Pages (from-to)L487-L490
JournalJapanese Journal of Applied Physics
Volume33
Issue number4
DOIs
Publication statusPublished - Apr 1994
Externally publishedYes

Fingerprint

Magnetic fields
Silicon
silicon
magnetic fields
X ray radiography
Hartmann number
radiography
Molten materials
x rays

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Change in velocity in silicon melt of the czochralski (CZ) process in a vertical magnetic field. / Yi, Kyung Woo; Watanabe, Masahito; Eguchi, Minoru; Kakimoto, Koichi; Hibiya, Taketoshi.

In: Japanese Journal of Applied Physics, Vol. 33, No. 4, 04.1994, p. L487-L490.

Research output: Contribution to journalArticle

Yi, Kyung Woo ; Watanabe, Masahito ; Eguchi, Minoru ; Kakimoto, Koichi ; Hibiya, Taketoshi. / Change in velocity in silicon melt of the czochralski (CZ) process in a vertical magnetic field. In: Japanese Journal of Applied Physics. 1994 ; Vol. 33, No. 4. pp. L487-L490.
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