Characteristics of bloch line pair propagation with cr bit pattern

Hironori Asada, Junichi Yamato, Satoru Ikeda, Kimihide Matsuyama

Research output: Contribution to journalArticle

Abstract

The artificial stress-induced anisotropy in a liquid phase epitaxial garnet film has been studied aiming at the application to a bit confinement pattern in Bloch line memory. The potential well for a vertical Bloch line (VBL) pair generated by the stress-induced anisotropy variation has been computed. VBL bit propagation is studied experimentally for a test chip with the stress-induced bit positions. The bit propagation was successfully performed under the Cr bit pattern with a periodic film thickness variation of 0.08 ym by applying the drive pulses with rise time shorter than 100 ns and fall time longer than 1000 ns.

Original languageEnglish
Pages (from-to)L1644-L1646
JournalJapanese journal of applied physics
Volume30
Issue number9
DOIs
Publication statusPublished - Sep 1991

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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