Characteristics of metal-polycrystalline diamond contact field emitters

Takashi Sugino, Yukio Iwasaki, Seiji Kawasaki, Yuuko Yokota, Reiji Hattori, Junji Shirafuji

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Electron emission characteristics have been investigated for polycrystalline diamond films. When the surface of the diamond films deposited on Si substrates and the rear face on which Au/diamond contact is formed are subjected to O2 plasma treatment or annealing, an increase of the electric field commencing electron emission occurs in comparison with that for H2 plasma-treated diamond surface. In the case of the surface treatment, emission characteristics are recovered by H2 plasma treatment after O2 plasma treatment or annealing, while no recovery of the electric field occurs for the Au/diamond sample in which the rear face of the diamond film is treated in the same manner. It is suggested that there exists another factor dominating the field emission characteristic other than field emission mechanisms such as electron injection at the diamond-metal contact and electron emission at the surface with negative electron affinity.

Original languageEnglish
Pages (from-to)677-681
Number of pages5
JournalDiamond and Related Materials
Volume7
Issue number2-5
Publication statusPublished - Feb 1 1998

Fingerprint

Diamond
Diamonds
Electron emission
Diamond films
emitters
Metals
diamond films
diamonds
electron emission
Plasmas
field emission
Field emission
metals
Electric fields
Annealing
negative electron affinity
Electron affinity
Electron injection
annealing
electric fields

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

Sugino, T., Iwasaki, Y., Kawasaki, S., Yokota, Y., Hattori, R., & Shirafuji, J. (1998). Characteristics of metal-polycrystalline diamond contact field emitters. Diamond and Related Materials, 7(2-5), 677-681.

Characteristics of metal-polycrystalline diamond contact field emitters. / Sugino, Takashi; Iwasaki, Yukio; Kawasaki, Seiji; Yokota, Yuuko; Hattori, Reiji; Shirafuji, Junji.

In: Diamond and Related Materials, Vol. 7, No. 2-5, 01.02.1998, p. 677-681.

Research output: Contribution to journalArticle

Sugino, T, Iwasaki, Y, Kawasaki, S, Yokota, Y, Hattori, R & Shirafuji, J 1998, 'Characteristics of metal-polycrystalline diamond contact field emitters', Diamond and Related Materials, vol. 7, no. 2-5, pp. 677-681.
Sugino T, Iwasaki Y, Kawasaki S, Yokota Y, Hattori R, Shirafuji J. Characteristics of metal-polycrystalline diamond contact field emitters. Diamond and Related Materials. 1998 Feb 1;7(2-5):677-681.
Sugino, Takashi ; Iwasaki, Yukio ; Kawasaki, Seiji ; Yokota, Yuuko ; Hattori, Reiji ; Shirafuji, Junji. / Characteristics of metal-polycrystalline diamond contact field emitters. In: Diamond and Related Materials. 1998 ; Vol. 7, No. 2-5. pp. 677-681.
@article{629589d4f70041fcbda7411b675c4c1c,
title = "Characteristics of metal-polycrystalline diamond contact field emitters",
abstract = "Electron emission characteristics have been investigated for polycrystalline diamond films. When the surface of the diamond films deposited on Si substrates and the rear face on which Au/diamond contact is formed are subjected to O2 plasma treatment or annealing, an increase of the electric field commencing electron emission occurs in comparison with that for H2 plasma-treated diamond surface. In the case of the surface treatment, emission characteristics are recovered by H2 plasma treatment after O2 plasma treatment or annealing, while no recovery of the electric field occurs for the Au/diamond sample in which the rear face of the diamond film is treated in the same manner. It is suggested that there exists another factor dominating the field emission characteristic other than field emission mechanisms such as electron injection at the diamond-metal contact and electron emission at the surface with negative electron affinity.",
author = "Takashi Sugino and Yukio Iwasaki and Seiji Kawasaki and Yuuko Yokota and Reiji Hattori and Junji Shirafuji",
year = "1998",
month = "2",
day = "1",
language = "English",
volume = "7",
pages = "677--681",
journal = "Diamond and Related Materials",
issn = "0925-9635",
publisher = "Elsevier BV",
number = "2-5",

}

TY - JOUR

T1 - Characteristics of metal-polycrystalline diamond contact field emitters

AU - Sugino, Takashi

AU - Iwasaki, Yukio

AU - Kawasaki, Seiji

AU - Yokota, Yuuko

AU - Hattori, Reiji

AU - Shirafuji, Junji

PY - 1998/2/1

Y1 - 1998/2/1

N2 - Electron emission characteristics have been investigated for polycrystalline diamond films. When the surface of the diamond films deposited on Si substrates and the rear face on which Au/diamond contact is formed are subjected to O2 plasma treatment or annealing, an increase of the electric field commencing electron emission occurs in comparison with that for H2 plasma-treated diamond surface. In the case of the surface treatment, emission characteristics are recovered by H2 plasma treatment after O2 plasma treatment or annealing, while no recovery of the electric field occurs for the Au/diamond sample in which the rear face of the diamond film is treated in the same manner. It is suggested that there exists another factor dominating the field emission characteristic other than field emission mechanisms such as electron injection at the diamond-metal contact and electron emission at the surface with negative electron affinity.

AB - Electron emission characteristics have been investigated for polycrystalline diamond films. When the surface of the diamond films deposited on Si substrates and the rear face on which Au/diamond contact is formed are subjected to O2 plasma treatment or annealing, an increase of the electric field commencing electron emission occurs in comparison with that for H2 plasma-treated diamond surface. In the case of the surface treatment, emission characteristics are recovered by H2 plasma treatment after O2 plasma treatment or annealing, while no recovery of the electric field occurs for the Au/diamond sample in which the rear face of the diamond film is treated in the same manner. It is suggested that there exists another factor dominating the field emission characteristic other than field emission mechanisms such as electron injection at the diamond-metal contact and electron emission at the surface with negative electron affinity.

UR - http://www.scopus.com/inward/record.url?scp=0031994118&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031994118&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0031994118

VL - 7

SP - 677

EP - 681

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

IS - 2-5

ER -