Characteristics of SiH4/H2 VHF plasma produced by short gap discharge

Tatsuyuki Nishimiya; Tsukasa Yamane; Sachiko Nakao; Yoshiaki Takeuchi; Yasuhiro Yamauchi; Hiromu Takatsuka; Hiroshi Muta; Kiichiro Uchino; Yoshinobu Kawai

doi:10.1016/j.surfcoat.2011.02.043

Characteristics of SiH₄/H₂ VHF plasma produced by short gap discharge

Tatsuyuki Nishimiya, Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article

Abstract

A SiH₄/H₂ VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.

Original language	English
Journal	Surface and Coatings Technology
Volume	205
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1016/j.surfcoat.2011.02.043
Publication status	Published - Jul 25 2011

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All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Cite this

Nishimiya, T., Yamane, T., Nakao, S., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., ... Kawai, Y. (2011). Characteristics of SiH₄/H₂ VHF plasma produced by short gap discharge. Surface and Coatings Technology, 205(SUPPL. 2). https://doi.org/10.1016/j.surfcoat.2011.02.043

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AU - Yamauchi, Yasuhiro

AU - Takatsuka, Hiromu

AU - Muta, Hiroshi

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

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10.1016/j.surfcoat.2011.02.043