Characteristics of SiH4/H2 VHF plasma produced by short gap discharge

Tatsuyuki Nishimiya, Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Research output: Contribution to journalArticlepeer-review

Abstract

A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.

Original languageEnglish
Pages (from-to)S411-S414
JournalSurface and Coatings Technology
Volume205
Issue numberSUPPL. 2
DOIs
Publication statusPublished - Jul 25 2011

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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