TY - JOUR
T1 - Characteristics of SiH4/H2 VHF plasma produced by short gap discharge
AU - Nishimiya, Tatsuyuki
AU - Yamane, Tsukasa
AU - Nakao, Sachiko
AU - Takeuchi, Yoshiaki
AU - Yamauchi, Yasuhiro
AU - Takatsuka, Hiromu
AU - Muta, Hiroshi
AU - Uchino, Kiichiro
AU - Kawai, Yoshinobu
PY - 2011/7/25
Y1 - 2011/7/25
N2 - A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.
AB - A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed.
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U2 - 10.1016/j.surfcoat.2011.02.043
DO - 10.1016/j.surfcoat.2011.02.043
M3 - Article
AN - SCOPUS:79959794238
VL - 205
SP - S411-S414
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - SUPPL. 2
ER -