Charge-compensative ion substitution of La3+-substituted bismuth titanate thin films for enhancement of remanent polarization

Hiroshi Uchida, Isao Okada, Hirofumi Matsuda, Takashi Iijima, Takayuki Watanabe, Hiroshi Funakubo

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17 Citations (Scopus)

Abstract

Ferroelectric properties of La3+-substituted bismuth titanate (BLT) films were modified by Ti-site substitution using higher-valence ions than the Ti4+ ion. Thin films of V5+-, W6+-, Zr4+- and nonsubstituted BLT, i.e., (Bi3.24La 0.75)(Ti2.97V0.03)O12 (BLTV), (Bi3.23La0.75)(Ti2.97W0.03)O 12 (BLTW), (Bi3.25La0.75)(Ti 2.97Zr0.03)O12 (BLTZ) and (Bi 3.25La0.75)Ti3.00O12, respectively, were fabricated on (111)Pt/Ti/SiO2/(100)Si substrates by chemical solution deposition. These films consisted of isotropic granular structures without a preferred crystal orientation. Remanent polarizations (Pr) of the BLTV and BLTW films (13 and 12μC/cm2, respectively) were larger than those of the BLT and BLTZ films (8 and 9μC/cm2, respectively), while those films had similar coercive fields (Ec) of approximately 120kV/cm. BLTV and BLTW films also had lower leakage current densities (approximately 10-8 A/cm2 at 100kV/cm) than that of BLT film (approximately 10-6A/cm2 at 100kV/cm). As no obvious difference was found in the crystal orientation or the microstructure, the enhancement of the Prvalue and suppression of the leakage current density could be achieved on a BLT film by the charge compensation using higher-valence ions than the Ti4+ ion.

Original languageEnglish
Pages (from-to)2636-2639
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number5 A
DOIs
Publication statusPublished - May 2004

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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