Chemical bonding of nitrogenated ultrananocrystalline diamond films deposited on titanium substrates by pulsed laser deposition

Sausan Al-Riyami, Hiroki Gima, Hiroshi Akamine, Tsuyoshi Yoshitake

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1 Citation (Scopus)

Abstract

Ultrananocrystalline diamond (UNCD)/nonhydrogenated nitrogenated amorphous carbon (a-C:N) composite (UNCD/a-C:N) films were prepared on titanium substrates in a nitrogen atmosphere by pulsed laser deposition, and their adhesion to the titanium substrates was remarkably improved as compared with those of UNCD/hydrogenated nitrogenized amorphous carbon (a-C:H:N) composite films deposited in a nitrogen and hydrogen mixture atmosphere. Their chemical bonding structures were investigated in details by X-ray photoemission and near edge X-ray absorption fine structure spectroscopies with synchrotron radiation. The UNCD/a-C:N films exhibit an obviously enhanced formation of sp2 and sp bonding such as C=N and CßN bonds. It should be contributable to the adhesion improvement. Since its formation locally disconnects sp3 bonding networks in the films, an internal stress, which is the main reason for exfoliation, should be released.

Original languageEnglish
JournalECS Journal of Solid State Science and Technology
Volume2
Issue number11
DOIs
Publication statusPublished - Nov 18 2013

Fingerprint

Diamond
Diamond films
Amorphous carbon
Pulsed laser deposition
Titanium
Diamonds
Carbon films
Amorphous films
Substrates
Nitrogen
Adhesion
X ray absorption near edge structure spectroscopy
Photoemission
Composite films
Synchrotron radiation
Hydrogen
Residual stresses
X rays
Composite materials

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

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title = "Chemical bonding of nitrogenated ultrananocrystalline diamond films deposited on titanium substrates by pulsed laser deposition",
abstract = "Ultrananocrystalline diamond (UNCD)/nonhydrogenated nitrogenated amorphous carbon (a-C:N) composite (UNCD/a-C:N) films were prepared on titanium substrates in a nitrogen atmosphere by pulsed laser deposition, and their adhesion to the titanium substrates was remarkably improved as compared with those of UNCD/hydrogenated nitrogenized amorphous carbon (a-C:H:N) composite films deposited in a nitrogen and hydrogen mixture atmosphere. Their chemical bonding structures were investigated in details by X-ray photoemission and near edge X-ray absorption fine structure spectroscopies with synchrotron radiation. The UNCD/a-C:N films exhibit an obviously enhanced formation of sp2 and sp bonding such as C=N and C{\ss}N bonds. It should be contributable to the adhesion improvement. Since its formation locally disconnects sp3 bonding networks in the films, an internal stress, which is the main reason for exfoliation, should be released.",
author = "Sausan Al-Riyami and Hiroki Gima and Hiroshi Akamine and Tsuyoshi Yoshitake",
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AU - Al-Riyami, Sausan

AU - Gima, Hiroki

AU - Akamine, Hiroshi

AU - Yoshitake, Tsuyoshi

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N2 - Ultrananocrystalline diamond (UNCD)/nonhydrogenated nitrogenated amorphous carbon (a-C:N) composite (UNCD/a-C:N) films were prepared on titanium substrates in a nitrogen atmosphere by pulsed laser deposition, and their adhesion to the titanium substrates was remarkably improved as compared with those of UNCD/hydrogenated nitrogenized amorphous carbon (a-C:H:N) composite films deposited in a nitrogen and hydrogen mixture atmosphere. Their chemical bonding structures were investigated in details by X-ray photoemission and near edge X-ray absorption fine structure spectroscopies with synchrotron radiation. The UNCD/a-C:N films exhibit an obviously enhanced formation of sp2 and sp bonding such as C=N and CßN bonds. It should be contributable to the adhesion improvement. Since its formation locally disconnects sp3 bonding networks in the films, an internal stress, which is the main reason for exfoliation, should be released.

AB - Ultrananocrystalline diamond (UNCD)/nonhydrogenated nitrogenated amorphous carbon (a-C:N) composite (UNCD/a-C:N) films were prepared on titanium substrates in a nitrogen atmosphere by pulsed laser deposition, and their adhesion to the titanium substrates was remarkably improved as compared with those of UNCD/hydrogenated nitrogenized amorphous carbon (a-C:H:N) composite films deposited in a nitrogen and hydrogen mixture atmosphere. Their chemical bonding structures were investigated in details by X-ray photoemission and near edge X-ray absorption fine structure spectroscopies with synchrotron radiation. The UNCD/a-C:N films exhibit an obviously enhanced formation of sp2 and sp bonding such as C=N and CßN bonds. It should be contributable to the adhesion improvement. Since its formation locally disconnects sp3 bonding networks in the films, an internal stress, which is the main reason for exfoliation, should be released.

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