Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs

Takayoshi Ishimoto, Ryo Nagumo, Teppei Ogura, Takashi Ishihara, Boyeong Kim, Akira Miyamoto, Michihisa Koyama

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

To enhance the durability of perfluorosulfonic acid (PFSA) polymer for proton-exchange membrane fuel cells (PEMFCs), we theoretically analyzed the degradation mechanism of PFSA by the attack of a hydroxyl (OH) radical. We used CF3(CF2)3O(CF2)2OCF 2SO3H as a model compound representing the PFSA side chain because the experimental result suggested that the ether group in the PFSA side chain is vulnerable to the OH radical attack. We performed density functional theory calculation to discuss the degradation reaction mechanism of the ether group in the model compound of the side chain and OH radical. Under high humidity condition, we clearly demonstrated the degradation mechanism and reactivity of C-O bond cleavage in the ether group by the OH radical. This result shows reasonable agreement with the experimental one. However, the OH radical prefers the reaction of the sulfonic acid group to the ether group under the low humidity condition. We found the different reactivity of the OH radical under the low and high humidity conditions. To improve the durability of PFSA, we proposed four directions: (i) enhancement of deprotonation, (ii) protection of ether group by steric hindrance, (iii) enhancement of C-O bond strength, and (iv) substitution of the ether group by other chemical groups. The latter two directions have been theoretically explored more in detail.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume157
Issue number9
DOIs
Publication statusPublished - Aug 26 2010

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hydroxyl radicals
Proton exchange membrane fuel cells (PEMFC)
Hydroxyl Radical
Ether
attack
fuel cells
Ethers
Polymers
degradation
membranes
Degradation
ethers
acids
protons
Acids
polymers
Atmospheric humidity
humidity
Durability
durability

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs. / Ishimoto, Takayoshi; Nagumo, Ryo; Ogura, Teppei; Ishihara, Takashi; Kim, Boyeong; Miyamoto, Akira; Koyama, Michihisa.

In: Journal of the Electrochemical Society, Vol. 157, No. 9, 26.08.2010.

Research output: Contribution to journalArticle

Ishimoto, Takayoshi ; Nagumo, Ryo ; Ogura, Teppei ; Ishihara, Takashi ; Kim, Boyeong ; Miyamoto, Akira ; Koyama, Michihisa. / Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs. In: Journal of the Electrochemical Society. 2010 ; Vol. 157, No. 9.
@article{496ab4f8c0cf4d14ac9182e085df3418,
title = "Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs",
abstract = "To enhance the durability of perfluorosulfonic acid (PFSA) polymer for proton-exchange membrane fuel cells (PEMFCs), we theoretically analyzed the degradation mechanism of PFSA by the attack of a hydroxyl (OH) radical. We used CF3(CF2)3O(CF2)2OCF 2SO3H as a model compound representing the PFSA side chain because the experimental result suggested that the ether group in the PFSA side chain is vulnerable to the OH radical attack. We performed density functional theory calculation to discuss the degradation reaction mechanism of the ether group in the model compound of the side chain and OH radical. Under high humidity condition, we clearly demonstrated the degradation mechanism and reactivity of C-O bond cleavage in the ether group by the OH radical. This result shows reasonable agreement with the experimental one. However, the OH radical prefers the reaction of the sulfonic acid group to the ether group under the low humidity condition. We found the different reactivity of the OH radical under the low and high humidity conditions. To improve the durability of PFSA, we proposed four directions: (i) enhancement of deprotonation, (ii) protection of ether group by steric hindrance, (iii) enhancement of C-O bond strength, and (iv) substitution of the ether group by other chemical groups. The latter two directions have been theoretically explored more in detail.",
author = "Takayoshi Ishimoto and Ryo Nagumo and Teppei Ogura and Takashi Ishihara and Boyeong Kim and Akira Miyamoto and Michihisa Koyama",
year = "2010",
month = "8",
day = "26",
doi = "10.1149/1.3462970",
language = "English",
volume = "157",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "9",

}

TY - JOUR

T1 - Chemical degradation mechanism of model compound, CF3(CF 2)3O(CF2)2OCF2SO 3H, of PFSA polymer by attack of hydroxyl radical in PEMFCs

AU - Ishimoto, Takayoshi

AU - Nagumo, Ryo

AU - Ogura, Teppei

AU - Ishihara, Takashi

AU - Kim, Boyeong

AU - Miyamoto, Akira

AU - Koyama, Michihisa

PY - 2010/8/26

Y1 - 2010/8/26

N2 - To enhance the durability of perfluorosulfonic acid (PFSA) polymer for proton-exchange membrane fuel cells (PEMFCs), we theoretically analyzed the degradation mechanism of PFSA by the attack of a hydroxyl (OH) radical. We used CF3(CF2)3O(CF2)2OCF 2SO3H as a model compound representing the PFSA side chain because the experimental result suggested that the ether group in the PFSA side chain is vulnerable to the OH radical attack. We performed density functional theory calculation to discuss the degradation reaction mechanism of the ether group in the model compound of the side chain and OH radical. Under high humidity condition, we clearly demonstrated the degradation mechanism and reactivity of C-O bond cleavage in the ether group by the OH radical. This result shows reasonable agreement with the experimental one. However, the OH radical prefers the reaction of the sulfonic acid group to the ether group under the low humidity condition. We found the different reactivity of the OH radical under the low and high humidity conditions. To improve the durability of PFSA, we proposed four directions: (i) enhancement of deprotonation, (ii) protection of ether group by steric hindrance, (iii) enhancement of C-O bond strength, and (iv) substitution of the ether group by other chemical groups. The latter two directions have been theoretically explored more in detail.

AB - To enhance the durability of perfluorosulfonic acid (PFSA) polymer for proton-exchange membrane fuel cells (PEMFCs), we theoretically analyzed the degradation mechanism of PFSA by the attack of a hydroxyl (OH) radical. We used CF3(CF2)3O(CF2)2OCF 2SO3H as a model compound representing the PFSA side chain because the experimental result suggested that the ether group in the PFSA side chain is vulnerable to the OH radical attack. We performed density functional theory calculation to discuss the degradation reaction mechanism of the ether group in the model compound of the side chain and OH radical. Under high humidity condition, we clearly demonstrated the degradation mechanism and reactivity of C-O bond cleavage in the ether group by the OH radical. This result shows reasonable agreement with the experimental one. However, the OH radical prefers the reaction of the sulfonic acid group to the ether group under the low humidity condition. We found the different reactivity of the OH radical under the low and high humidity conditions. To improve the durability of PFSA, we proposed four directions: (i) enhancement of deprotonation, (ii) protection of ether group by steric hindrance, (iii) enhancement of C-O bond strength, and (iv) substitution of the ether group by other chemical groups. The latter two directions have been theoretically explored more in detail.

UR - http://www.scopus.com/inward/record.url?scp=77955818983&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955818983&partnerID=8YFLogxK

U2 - 10.1149/1.3462970

DO - 10.1149/1.3462970

M3 - Article

AN - SCOPUS:77955818983

VL - 157

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 9

ER -