Abstract
A cluster-eliminating filter is developed to reduce a volume fraction VF of amorphous silicon nanoparticles above approximately 1 nm in size (referred to as a cluster) incorporated into a-Si:H films. The filter reduces the VF value by using the difference between a sticking probability of clusters and a surface reaction probability of SiH3 radicals, which are the predominant deposition radicals. By employing the filter together with a cluster-suppressed plasma chemical vapor deposition reactor, the VF value is reduced below 1180 compared to that for the conventional device quality films. Such cluster-free a-Si:H films have an extremely small hydrogen concentration associated with Si- H2 bonds below 5.46× 10-3 at. %.
Original language | English |
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Article number | 113501 |
Pages (from-to) | 1-4 |
Number of pages | 4 |
Journal | Review of Scientific Instruments |
Volume | 76 |
Issue number | 11 |
DOIs | |
Publication status | Published - Dec 12 2005 |
All Science Journal Classification (ASJC) codes
- Instrumentation