Clustering phenomena in low-pressure reactive plasmas. Basis and applications

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Abstract

Clustering phenomena of particles below a few nm in size in low-pressure reactive plasmas have been studied in capacitively coupled high-frequency SiH4 discharges. Clusters nucleate around a size of 0.5 nm, Si4Hx and subsequently grow due to influxes of SinHx (1 < n < 4) and other molecular species. Because of long gas-residence time and small surface loss-probability of clusters, even neutral ones accumulate to nucleate in the reactor. Appearance of negatively charged clusters is considered to become noticeable at around Si4Hx. The growth of clusters is suppressed by using thermophoretic force, gas flow, periodical discharge modulation, and hydrogen dilution. The reactor has been newly developed to suppress the growth of clusters both by thermophoretic force and by gas flow and evacuation without stagnation. Using the reactor, a-Si:H films of extremely high quality have been successfully deposited.

Original languageEnglish
Pages (from-to)483-487
Number of pages5
JournalPure and Applied Chemistry
Volume74
Issue number3
DOIs
Publication statusPublished - 2002

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Chemical Engineering(all)

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