Chemistry
Atom
8%
Chemical Activation
25%
Device
8%
Doping Material
16%
Germanium
100%
Ion Implantation
8%
Optimization
8%
Particle Size
8%
Potential
8%
Procedure
8%
Recrystallization
25%
Sample
33%
Sheet Resistance
8%
Strain
8%
Tin
25%
Engineering
Activation
25%
Annealing Process
8%
Carrier Mobility
8%
Current Drive
8%
Dopants
16%
Fabrication
8%
High Degree
8%
Implantation
25%
Induced Stress
8%
Laser Fluence
8%
Optimization
8%
Peak Shift
8%
Process Parameter
8%
Raman Peak
8%
Recrystallization
25%
Severe Damage
8%
Sheet Resistance
8%
Silicon
25%
Thermal Annealing
25%
Biochemistry, Genetics and Molecular Biology
Atom
8%
Attention
8%
Crystallization
25%
Drive
8%
Electric Potential
8%
Krypton Fluoride Laser
8%
Sample
33%
Stress
8%
Pharmacology, Toxicology and Pharmaceutical Science
Germanium
33%
Phosphorus
8%
Recrystallization
25%
Silicon
8%
Material Science
Carrier Mobility
8%
Doping (Additives)
16%
Laser
25%