Codeposition on diamond film surface during reactive ion etching in SF6 and O2 plasmas

K. Teii, M. Hori, T. Goto

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


Polycrystalline diamond films were exposed to electron cyclotron resonance (ECR) SF6 and O2 ion etching plasmas. The films were etched by varying an applied negative substrate bias, and the resulting surface was analyzed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy.

Original languageEnglish
Pages (from-to)2779-2784
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number6
Publication statusPublished - Nov 1 2000
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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