Polycrystalline diamond films were exposed to electron cyclotron resonance (ECR) SF6 and O2 ion etching plasmas. The films were etched by varying an applied negative substrate bias, and the resulting surface was analyzed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy.
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - Nov 1 2000|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films