Codeposition on diamond film surface during reactive ion etching in SF6 and O2 plasmas

K. Teii, M. Hori, T. Goto

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Polycrystalline diamond films were exposed to electron cyclotron resonance (ECR) SF6 and O2 ion etching plasmas. The films were etched by varying an applied negative substrate bias, and the resulting surface was analyzed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy.

Original languageEnglish
Pages (from-to)2779-2784
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number6
DOIs
Publication statusPublished - Nov 1 2000

Fingerprint

Electron cyclotron resonance
Plasma etching
Diamond films
Reactive ion etching
plasma etching
electron cyclotron resonance
diamond films
Raman spectroscopy
X ray photoelectron spectroscopy
etching
photoelectron spectroscopy
Ions
Plasmas
Scanning electron microscopy
scanning electron microscopy
Substrates
ions
x rays

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Codeposition on diamond film surface during reactive ion etching in SF6 and O2 plasmas. / Teii, K.; Hori, M.; Goto, T.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 18, No. 6, 01.11.2000, p. 2779-2784.

Research output: Contribution to journalArticle

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