TY - JOUR
T1 - Combinatorial analyses of plasma-polymer interactions
AU - Setsuhara, Yuichi
AU - Cho, Ken
AU - Takenaka, Kosuke
AU - Shiratani, Masaharu
AU - Sekine, Makoto
AU - Hori, Masaru
N1 - Funding Information:
This work was supported in part by The Global COE Program “Center of Excellence for Advanced Structural and Functional Materials Design” from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, and Grant-in-Aid for Inter-University Cooperative Research Project on “Advanced Materials Development and Integration of Novel Structured Metallic and Inorganic Materials” from MEXT, Japan.
PY - 2011/7/25
Y1 - 2011/7/25
N2 - Plasma-process analyses were demonstrated on the basis of combinatorial method, in which process examinations with continuous variations of plasma-process conditions can be carried out on a substrate holder with a graded distribution of process parameters. Controllability of density gradation in the combinatorial plasma process analyzer together with combinatorial analyses of etching characteristics and surface chemical bonding states of polyethylene terephthalate (PET) films exposed to argon-oxygen mixture plasmas. The etching properties and chemical bonding states (phenyl group) have been investigated for the PET films exposed to argon-oxygen mixture plasmas. The etching-depth data obtained from three independent batches of the experiments showed universal and almost linear dependence with increasing product of (ion saturation current) × (exposure time), which is in proportion to ion dose. The chemical bonding state analyses of phenyl group showed insignificant degradation with increasing ion dose.
AB - Plasma-process analyses were demonstrated on the basis of combinatorial method, in which process examinations with continuous variations of plasma-process conditions can be carried out on a substrate holder with a graded distribution of process parameters. Controllability of density gradation in the combinatorial plasma process analyzer together with combinatorial analyses of etching characteristics and surface chemical bonding states of polyethylene terephthalate (PET) films exposed to argon-oxygen mixture plasmas. The etching properties and chemical bonding states (phenyl group) have been investigated for the PET films exposed to argon-oxygen mixture plasmas. The etching-depth data obtained from three independent batches of the experiments showed universal and almost linear dependence with increasing product of (ion saturation current) × (exposure time), which is in proportion to ion dose. The chemical bonding state analyses of phenyl group showed insignificant degradation with increasing ion dose.
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U2 - 10.1016/j.surfcoat.2011.04.083
DO - 10.1016/j.surfcoat.2011.04.083
M3 - Article
AN - SCOPUS:80955180544
SN - 0257-8972
VL - 205
SP - S484-S489
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - SUPPL. 2
ER -