Combining multi-step imprinting with the in-plane compression method

In this study, a micro-patterning process is proposed and developed in order to obtain various functional properties on the surface of an object. Nano imprint lithography has recently been the focus of much attention, because of advantages such as high accuracy, low cost, and ease of operation. However, problems can occur during demolding when using this method, such as the destruction of high aspect patterns during the process. It is also, almost impossible to form an over-hanging pattern. In order to overcome these problems, we propose a multi-step imprinting process with an in-plane compression method. A hierarchical multi-scale pattern can be produced using multi-step imprinting, and the aspect ratio of the imprinted pattern can be increased by using the in-plane compression method. A hierarchical multi-scale pattern with a high aspect ratio was produced by combining the two methods. The effectiveness of the proposed method is demonstrated by the results of the experimentation.