Comparison between Ar+CH4 cathode and anode coupling chemical vapor depositions of hydrogenated amorphous carbon films

Sung Hwa Hwang, Ryosuke Iwamoto, Takamasa Okumura, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Tatsuyuki Nakatani, Masaharu Shiratani

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3 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

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